Issued Patents 2004
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6822107 | Chemical vapor deposition precursors for deposition of copper | Gautam Bhandari, Chongying Xu | 2004-11-23 |
| 6800218 | Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same | Ying Ma, Michael Jones, Deepak Verma, David Bernhard | 2004-10-05 |
| 6773873 | pH buffered compositions useful for cleaning residue from semiconductor substrates | Ma. Fatima Seijo, William A. Wojtczak, David Bernhard, David W. Minsek | 2004-08-10 |
| 6767830 | Br2SbCH3 a solid source ion implant and CVD precursor | Ziyun Wang, Chongying Xu, Michael A. Todd, Niamh McMahon | 2004-07-27 |
| 6740586 | Vapor delivery system for solid precursors and method of using same | Luping Wang, Chongying Xu | 2004-05-25 |
| 6736993 | Silicon reagents and low temperature CVD method of forming silicon-containing gate dielectric materials using same | Chongying Xu, Bryan C. Hendrix | 2004-05-18 |
| 6735978 | Treatment of supercritical fluid utilized in semiconductor manufacturing applications | Glenn M. Tom, Michael B. Korzenski, Eliodor G. Ghenciu, Chongying Xu | 2004-05-18 |
| 6730523 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2004-05-04 |
| 6709610 | Isotropic dry cleaning process for noble metal integrated circuit structures | Peter C. Van Buskirk, Frank Dimeo, Jr., Peter S. Kirlin | 2004-03-23 |
| 6692546 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, William A. Wojtczak, Cary Regulski, David Bernhard, Deepak Verma | 2004-02-17 |
| 6692569 | A-SITE-AND/OR B-SITE-MODIFIED PBZRTIO3 MATERIALS AND (PB, SR, CA, BA, MG) (ZR, TI,NB, TA)O3 FILMS HAVING UTILITY IN FERROELECTRIC RANDOM ACCESS MEMORIES AND HIGH PERFORMANCE THIN FILM MICROACTUATORS | Jeffrey F. Roeder, Ing-Shin Chen, Steven M. Bilodeau | 2004-02-17 |