Issued Patents 2003
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660638 | CMP process leaving no residual oxide layer or slurry particles | Ying-Lang Wang, Shih-Chi Lin, Chi-Wen Liu, Ming-Hua Yoo, Wen-Kung Cheng +1 more | 2003-12-09 |
| 6602560 | Method for removing residual fluorine in HDP-CVD chamber | Wen-Kung Cheng, Ming-Hwa Yoo, Szu-An Wu, Ying-Long Wang, Pei-Fen Chou | 2003-08-05 |
| 6584987 | Method for improved cleaning in HDP-CVD process with reduced NF3 usage | Chun-Ching Tsan, Wen-Kung Cheng, Yin-Lang Wang | 2003-07-01 |