Issued Patents 2003
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660638 | CMP process leaving no residual oxide layer or slurry particles | Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Wen-Kung Cheng +1 more | 2003-12-09 |
MY
Ming-Hua Yoo
Overall (2003): #153,166 of 273,478Top 60%
1
Patents 2003