Issued Patents 2003
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660638 | CMP process leaving no residual oxide layer or slurry particles | Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Ming-Hua Yoo +1 more | 2003-12-09 |
| 6602560 | Method for removing residual fluorine in HDP-CVD chamber | Yi-Lung Cheng, Ming-Hwa Yoo, Szu-An Wu, Ying-Long Wang, Pei-Fen Chou | 2003-08-05 |
| 6584987 | Method for improved cleaning in HDP-CVD process with reduced NF3 usage | Yi-Lung Cheng, Chun-Ching Tsan, Yin-Lang Wang | 2003-07-01 |
| 6558228 | Method of unloading substrates in chemical-mechanical polishing apparatus | Hung-Ju Chien, Jin C J Chen, Ying-Lang Wang | 2003-05-06 |