Issued Patents 2003
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6645679 | Attenuated phase shift mask for use in EUV lithography and a method of making such a mask | Bruno La Fontaine, Calvin T. Gabriel, Kouros Ghandehari | 2003-11-11 |
| 6627355 | Method of and system for improving stability of photomasks | Fan Piao, Christopher A. Spence | 2003-09-30 |
| 6623893 | Pellicle for use in EUV lithography and a method of making such a pellicle | Christopher F. Lyons | 2003-09-23 |
| 6608321 | Differential wavelength inspection system | Bruno La Fontaine, Jeffrey A. Schefske | 2003-08-19 |
| 6593035 | Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films | Christopher F. Lyons | 2003-07-15 |
| 6593037 | EUV mask or reticle having reduced reflections | Calvin T. Gabriel, Bruno M. LaFontaine | 2003-07-15 |
| 6556286 | Inspection system for the pupil of a lithographic tool | Bruno La Fontaine, Jongwook Kye | 2003-04-29 |
| 6544885 | Polished hard mask process for conductor layer patterning | Khanh B. Nguyen, Christopher F. Lyons, Scott A. Bell, Fei Wang, Chih-Yuh Yang | 2003-04-08 |
| 6544693 | Pellicle for use in small wavelength lithography and a method for making such a pellicle | Christopher F. Lyons | 2003-04-08 |
| 6535280 | Phase-shift-moiré focus monitor | Bruno La Fontaine, Jongwook Kye | 2003-03-18 |
| 6515272 | Method and apparatus for improving signal to noise ratio of an aerial image monitor | Bruno Fontaine | 2003-02-04 |