SW

Satoshi Watanabe

SC Shin-Etsu Chemical Co.: 5 patents #10 of 255Top 4%
CC Clarion Co.: 1 patents #5 of 17Top 30%
Fujitsu Limited: 1 patents #992 of 3,085Top 35%
AT Agilent Technologies: 1 patents #114 of 465Top 25%
Honda Motor Co.: 1 patents #404 of 1,310Top 35%
SI Seiko Instruments: 1 patents #121 of 259Top 50%
HI Hitachi: 1 patents #1,533 of 3,950Top 40%
📍 Takarazuka, CA: #1 of 2 inventorsTop 50%
Overall (2002): #1,221 of 266,432Top 1%
11
Patents 2002

Issued Patents 2002

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
6493239 Arrangement of memory-card accomodating portions in a recording and reproducing apparatus Kunihiro Ando 2002-12-10
6486984 Wavelength monitor using hybrid approach Douglas M. Baney, Norihide Yamada, Shigeru Nakagawa, Yoshikatsu Ichimura 2002-11-26
6475650 Ferromagnetic material and magnetic apparatus employing the ferromagnetic material Toshiyuki Onogi, Masahiko Ichimura, Yoshimasa Ono, Tomihiro Hashizume, Yasuo Wada +1 more 2002-11-05
6444923 Method of connecting printed wiring boards with each other, and printed circuit board Shigeo Iriguchi, Yoshitaka Muraoka 2002-09-03
6440634 Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process Youichi Ohsawa, Jun Watanabe, Wataru Kusaki, Takeshi Nagata, Shigehiro Nagura 2002-08-27
6422546 Active vibration isolating support device Hirotomi Nemoto, Ken Iinuma, Tsutomu Ogawa, Hideki Matsuoka, Tetsuo Mikasa 2002-07-23
6416928 Onium salts, photoacid generators, resist compositions, and patterning process Youichi Ohsawa, Jun Watanabe, Shigehiro Nagura 2002-07-09
6411010 Piezoelectric actuator Yoko Suzuki, Kazuo Tani, Tatsuru Sato 2002-06-25
6395453 Photoresist compositions and patterning method Tatsushi Kaneko, Kenji Koizumi, Yoshitaka Yanagi 2002-05-28
6338931 Resist compositions and patterning process Kazunori Maeda, Takeshi Nagata, Youichi Ohsawa, Jun Watanabe, Shigehiro Nagura 2002-01-15
6335141 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara +1 more 2002-01-01