Issued Patents 2002
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6490307 | Method and procedure to automatically stabilize excimer laser output parameters | Bruno Becker de Mos, Klaus Vogler | 2002-12-03 |
| 6490306 | Molecular fluorine laser with spectral linewidth of less than 1 pm | Sergei V. Govorkov | 2002-12-03 |
| 6466599 | Discharge unit for a high repetition rate excimer or molecular fluorine laser | Igor Bragin, Vadim Berger, Ulrich Rebhan | 2002-10-15 |
| 6463086 | Molecular fluorine laser with spectral linewidth of less than 1 pm | Sergei V. Govorkov | 2002-10-08 |
| 6456643 | Surface preionization for gas lasers | Rustem Osmanow | 2002-09-24 |
| 6430205 | Discharge unit for a high repetition rate excimer or molecular fluorine laser | Igor Bragin, Vadim Berger, Ulrich Rebhan | 2002-08-06 |
| 6426966 | Molecular fluorine (F2) laser with narrow spectral linewidth | Dirk Basting, Sergei V. Govorkov | 2002-07-30 |
| 6424666 | Line-narrowing module for high power laser | — | 2002-07-23 |
| 6414978 | Discharge unit for a high repetition rate excimer or molecular fluorine laser | Igor Bragin, Vadim Berger, Ulrich Rebhan | 2002-07-02 |
| 6404795 | Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines | Uwe Leinhos, Jürgen Kleinschmidt, Wolfgang Zschocke | 2002-06-11 |
| 6393040 | Molecular fluorine (F2) excimer laser with reduced coherence length | Sergei V. Govorkov | 2002-05-21 |
| 6389048 | Detector with frequency converting coating | Hans-Stephan Albrecht, Uwe Leinhos, Wolfgang Zschocke | 2002-05-14 |
| 6389045 | Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers | Klaus Mann, Thomas Schroder, Bernd Schafer, Uwe Leinhos | 2002-05-14 |
| 6381256 | Molecular fluorine laser with spectral linewidth of less than 1 pm | Sergei V. Govorkov | 2002-04-30 |