Issued Patents 2002
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6383906 | Method of forming junction-leakage free metal salicide in a semiconductor wafer with ultra-low silicon consumption | Karsten Wieczorek, Nicholas J. Kepler, Larry Wang | 2002-05-07 |
| 6380057 | Enhancement of nickel silicide formation by use of nickel pre-amorphizing implant | Matthew S. Buynoski, George Jonathan Kluth, Paul L. King | 2002-04-30 |
| 6380040 | Prevention of dopant out-diffusion during silicidation and junction formation | Nick Kepler, Karsten Wieczorek, Larry Wang | 2002-04-30 |
| 6376343 | Reduction of metal silicide/silicon interface roughness by dopant implantation processing | Matthew S. Buynoski, Qi Xiang | 2002-04-23 |
| 6372673 | Silicon-starved nitride spacer deposition | Minh Van Ngo, Christy Mei-Chu Woo, George Jonathan Kluth | 2002-04-16 |
| 6368967 | Method to control mechanical stress of copper interconnect line using post-plating copper anneal | — | 2002-04-09 |
| 6368950 | Silicide gate transistors | Qi Xiang, Matthew S. Buynoski, John Foster, Paul L. King, Eric N. Paton | 2002-04-09 |
| 6365516 | Advanced cobalt silicidation with in-situ hydrogen plasma clean | Austin Frenkel, Akif Sultan | 2002-04-02 |
| 6342414 | Damascene NiSi metal gate high-k transistor | Qi Xiang, Matthew S. Buynoski, John Foster, Paul L. King, Eric N. Paton | 2002-01-29 |