Issued Patents 2002
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475874 | Damascene NiSi metal gate high-k transistor | Qi Xiang, Paul R. Besser, Matthew S. Buynoski, John Foster, Paul L. King | 2002-11-05 |
| 6465334 | Enhanced electroless deposition of dielectric precursor materials for use in in-laid gate MOS transistors | Matthew S. Buynoski, Paul R. Besser, Paul L. King, Qi Xiang | 2002-10-15 |
| 6465309 | Silicide gate transistors | Qi Xiang, Paul R. Besser, Matthew S. Buynoski, John Foster, Paul L. King | 2002-10-15 |
| 6458679 | Method of making silicide stop layer in a damascene semiconductor structure | Paul R. Besser, Matthew S. Buynoski, Qi Xiang, Paul L. King, John Foster | 2002-10-01 |
| 6432805 | Co-deposition of nitrogen and metal for metal silicide formation | Minh Van Ngo, Paul R. Besser | 2002-08-13 |
| 6399467 | Method of salicide formation | Jeff P. Erhardt | 2002-06-04 |
| 6387786 | Method of salicide formation by siliciding a gate area prior to siliciding a source and drain area | Jeff P. Erhardt | 2002-05-14 |
| 6368950 | Silicide gate transistors | Qi Xiang, Paul R. Besser, Matthew S. Buynoski, John Foster, Paul L. King | 2002-04-09 |
| 6342414 | Damascene NiSi metal gate high-k transistor | Qi Xiang, Paul R. Besser, Matthew S. Buynoski, John Foster, Paul L. King | 2002-01-29 |