Issued Patents 1994
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5376802 | Stencil mask and charge particle beam exposure method and apparatus using the stencil mask | Kiichi Sakamoto, Yasushi Takahashi, Yoshihisa Oae | 1994-12-27 |
| 5369282 | Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput | Soichiro Arai, Junichi Kai, Yoshihisa Oae | 1994-11-29 |
| 5359202 | Electron beam exposure apparatus employing blanking aperture array | Yoshihisa Oae, Tomohiko Abe | 1994-10-25 |
| 5349197 | Method for exposing a pattern on an object by a charged particle beam | Kiichi Sakamoto | 1994-09-20 |
| 5347592 | Pattern judging method and mask producing method using the pattern judging method | Satoru Yamazaki, Kiichi Sakamoto | 1994-09-13 |
| 5338939 | Charged particle beam exposure including a heat blocking partition positioned near deflecting coils | Hisayasu Nishino, Akio Yamada, Yoshihisa Oae | 1994-08-16 |
| 5329130 | Charged particle beam exposure method and apparatus | Junichi Kai, Kazutaka Taki, Mitsuhiro Nakano | 1994-07-12 |
| 5288567 | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask | Kiichi Sakamoto, Yasushi Takahashi, Yoshihisa Oae | 1994-02-22 |
| 5278419 | Electron beam exposure process for writing a pattern on an object by an electron beam with a compensation of the proximity effect | Yasushi Takahashi | 1994-01-11 |