Issued Patents 1994
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5376802 | Stencil mask and charge particle beam exposure method and apparatus using the stencil mask | Yasushi Takahashi, Yoshihisa Oae, Hiroshi Yasuda | 1994-12-27 |
| 5364718 | Method of exposing patttern of semiconductor devices and stencil mask for carrying out same | Yoshihisa Oae | 1994-11-15 |
| 5349197 | Method for exposing a pattern on an object by a charged particle beam | Hiroshi Yasuda | 1994-09-20 |
| 5347592 | Pattern judging method and mask producing method using the pattern judging method | Hiroshi Yasuda, Satoru Yamazaki | 1994-09-13 |
| 5288567 | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask | Yasushi Takahashi, Yoshihisa Oae, Hiroshi Yasuda | 1994-02-22 |
| 5276331 | Electron beam exposure system | Yoshihisa Oae | 1994-01-04 |
| 5276334 | Charged particle beam exposure method and apparatus | Akio Yamada, Kenichi Kawashima | 1994-01-04 |