Issued Patents 1994
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5376802 | Stencil mask and charge particle beam exposure method and apparatus using the stencil mask | Kiichi Sakamoto, Yasushi Takahashi, Hiroshi Yasuda | 1994-12-27 |
| 5369282 | Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput | Soichiro Arai, Hiroshi Yasuda, Junichi Kai | 1994-11-29 |
| 5364718 | Method of exposing patttern of semiconductor devices and stencil mask for carrying out same | Kiichi Sakamoto | 1994-11-15 |
| 5359202 | Electron beam exposure apparatus employing blanking aperture array | Hiroshi Yasuda, Tomohiko Abe | 1994-10-25 |
| 5338939 | Charged particle beam exposure including a heat blocking partition positioned near deflecting coils | Hisayasu Nishino, Akio Yamada, Hiroshi Yasuda | 1994-08-16 |
| 5304811 | Lithography system using charged-particle beam and method of using the same | Akio Yamada, Satoru Yamazaki, Tomohiko Abe | 1994-04-19 |
| 5288567 | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask | Kiichi Sakamoto, Yasushi Takahashi, Hiroshi Yasuda | 1994-02-22 |
| 5276331 | Electron beam exposure system | Kiichi Sakamoto | 1994-01-04 |