Issued Patents 1994
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5362526 | Plasma-enhanced CVD process using TEOS for depositing silicon oxide | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1994-11-08 |
| 5354715 | Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1994-10-11 |
| 5300460 | UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers | Kenneth S. Collins, Craig A. Roderick, Chan-Lon Yang, David N. Wang | 1994-04-05 |
| 5294320 | Apparatus for cleaning a shield in a physical vapor deposition chamber | Sasson Somekh | 1994-03-15 |
| 5292393 | Multichamber integrated process system | Sasson Somekh, David N. Wang, David Cheng, Masato Toshima, Isaac Harari +1 more | 1994-03-08 |
| 5280983 | Semiconductor processing system with robotic autoloader and load lock | Sasson Somekh, Charles Ryan-Harris, Richard A. Seilheimer, David Cheng, Edward M. Abolnikov +5 more | 1994-01-25 |