Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5362526 | Plasma-enhanced CVD process using TEOS for depositing silicon oxide | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1994-11-08 |
| 5354715 | Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1994-10-11 |