EH

Eric D. Hermanson

VA Varian Semiconductor Equipment Associates: 31 patents #16 of 513Top 4%
Applied Materials: 6 patents #1,918 of 7,310Top 30%
🗺 Massachusetts: #2,065 of 88,656 inventorsTop 3%
Overall (All Time): #85,722 of 4,157,543Top 3%
38
Patents All Time

Issued Patents All Time

Showing 26–38 of 38 patents

Patent #TitleCo-InventorsDate
7863520 Interfacing two insulation parts in high voltage environment Russell J. Low, Kasegn D. Tekletsadik, Anthony Renau, Piotr Lubicki, D. Jeffrey Lischer +2 more 2011-01-04
7863531 Techniques for making high voltage connections Douglas E. May, Kasegn D. Tekletsadik, Piotr Lubicki, Russell J. Low, Joseph C. Olson +1 more 2011-01-04
7842934 Terminal structures of an ion implanter having insulated conductors with dielectric fins Kasegn D. Tekletsadik, Doug E. May, Steve Krause, Russell J. Low 2010-11-30
7799999 Insulated conducting device with multiple insulation segments Kasegn D. Tekletsadik, Steve Krause, Russell J. Low 2010-09-21
7576337 Power supply for an ion implantation system Piotr Lubicki, Russell J. Low, Steve Krause 2009-08-18
7482598 Techniques for preventing parasitic beamlets from affecting ion implantation Russell J. Low, Jonathan Gerald England, Stephen E. Krause 2009-01-27
7476878 Techniques for reducing effects of photoresist outgassing Russell J. Low, Jonathan Gerald England, Stephen E. Krause 2009-01-13
7402816 Electron injection in ion implanter magnets Anthony Renau, Donna L. Smatlak, James S. Buff 2008-07-22
7394073 Methods and apparatus for ion beam angle measurement in two dimensions James J. Cummings, Joseph C. Olson, Arthur H. Clough, Rosario Mollica, Paul J. Murphy +1 more 2008-07-01
7250617 Ion beam neutral detection Anthony Renau, Joseph C. Olson, Gordon C. Angel 2007-07-31
7202483 Methods and apparatus for ion beam angle measurement in two dimensions Joseph C. Olson, Rosario Mollica, Paul J. Murphy 2007-04-10
7170067 Ion beam measurement apparatus and method Anthony Renau, Joseph C. Olson, Gordon C. Angel 2007-01-30
6791097 Adjustable conductance limiting aperture for ion implanters Jay T. Scheuer, Anthony Renau 2004-09-14