NK

Naotaka Kubota

TC Tokyo Ohka Kogyo Co.: 17 patents #72 of 684Top 15%
Aisin Seiki Kabushiki Kaisha: 8 patents #423 of 3,782Top 15%
SE Seiko Epson: 8 patents #2,198 of 7,774Top 30%
RE Renesas Electronics: 2 patents #1,855 of 4,529Top 45%
AI Aisin: 1 patents #310 of 1,000Top 35%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
Overall (All Time): #88,752 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 26–37 of 37 patents

Patent #TitleCo-InventorsDate
7326515 Positive type resist composition and resist pattern formation method using same Takeshi Iwai, Satoshi Fujimura, Miwa Miyairi, Hideo Hada 2008-02-05
7323287 Positive type resist composition and resist pattern formation method using same Takeshi Iwai, Satoshi Fujimura, Miwa Miyairi, Hideo Hada 2008-01-29
7316885 Method of forming resist pattern, positive resist composition, and layered product Hideo Hada, Miwa Miyairi, Takeshi Iwai 2008-01-08
7316888 Positive type resist composition and resist pattern formation method using same Takeshi Iwai, Satoshi Fujimura, Miwa Miyairi, Hideo Hada 2008-01-08
7316889 Positive type resist composition and resist pattern formation method using same Takeshi Iwai, Satoshi Fujimura, Miwa Miyairi, Hideo Hada 2008-01-08
7129020 Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern Kazumasa Wakiya, Shigeru Yokoi, Takayuki Haraguchi 2006-10-31
7074543 Positive resist composition and method of forming resist pattern from the same Takeshi Iwai, Satoshi Fujimura, Miwa Miyairi, Hideo Hada 2006-07-11
7033731 Multilayered body for photolithographic patterning Toshikazu Tachikawa, Fumitake Kaneko, Miwa Miyairi, Takako Hirosaki, Koutaro Endo 2006-04-25
6864036 Negative-working photoresist composition Toshikazu Tachikawa, Fumitake Kaneko, Miwa Miyairi, Takako Hirosaki, Koutaro Endo 2005-03-08
6455228 Multilayered body for photolithographic patterning Toshikazu Tachikawa, Fumitake Kaneko, Miwa Miyairi, Takako Hirosaki, Koutaro Endo 2002-09-24
6416930 Composition for lithographic anti-reflection coating, and resist laminate using the same Kazumasa Wakiya, Shigeru Yokoi, Masakazu Kobayashi 2002-07-09
6406829 Negative-working photoresist composition Toshikazu Tachikawa, Fumitake Kaneko, Miwa Miyairi, Takako Hirosaki, Koutaro Endo 2002-06-18