Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11427909 | Plasma processing apparatus | — | 2022-08-30 |
| 8974628 | Plasma treatment device and optical monitor device | Toshihisa Nozawa, Takahiro Senda, Munetaka Yamagami, Kazuki Moyama | 2015-03-10 |
| 8968512 | Temperature adjusting mechanism and semiconductor manufacturing apparatus using temperature adjusting mechanism | — | 2015-03-03 |
| 8485127 | Processing apparatus | Tamaki Yuasa | 2013-07-16 |
| 8327795 | Microwave plasma processing apparatus and method of supplying microwaves using the apparatus | — | 2012-12-11 |
| 8267040 | Plasma processing apparatus and plasma processing method | Kiyotaka Ishibashi, Junichi Kitagawa, Singo Furui, Cai Zhong Tian, Jun Yamashita +4 more | 2012-09-18 |
| 8242405 | Microwave plasma processing apparatus and method for producing cooling jacket | — | 2012-08-14 |
| 8171880 | Microwave plasma processing apparatus and method of supplying microwaves using the apparatus | — | 2012-05-08 |
| 8057600 | Method and apparatus for an improved baffle plate in a plasma processing system | Kouji Mitsuhashi, Hiroyuki Nakayama | 2011-11-15 |
| 7811428 | Method and apparatus for an improved optical window deposition shield in a plasma processing system | Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama | 2010-10-12 |
| 7663860 | Electrostatic chuck | Hiroyuki Nakayama, Hidetoshi Kimura | 2010-02-16 |
| 7566379 | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system | Kouji Mitsuhashi, Hiroyuki Nakayama | 2009-07-28 |
| 7282112 | Method and apparatus for an improved baffle plate in a plasma processing system | Kouji Mitsuhashi, Hiroyuki Nakayama | 2007-10-16 |
| 7163585 | Method and apparatus for an improved optical window deposition shield in a plasma processing system | Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama | 2007-01-16 |
| 7147749 | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system | Kouji Mitsuhashi, Hiroyuki Nakayama | 2006-12-12 |
| 6837966 | Method and apparatus for an improved baffle plate in a plasma processing system | Kouji Mitsuhashi, Hiroyuki Nakayama | 2005-01-04 |
| 6798519 | Method and apparatus for an improved optical window deposition shield in a plasma processing system | Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama | 2004-09-28 |