| 6930028 |
Antireflective structure and method |
Maureen A. Hanratty, Daty M. Rogers, Qizhi He |
2005-08-16 |
| 6800928 |
Porous integrated circuit dielectric with decreased surface porosity |
Richard Scott List, Changming Jin |
2004-10-05 |
| 6774489 |
Dielectric layer liner for an integrated circuit structure |
Steven W. Russell |
2004-08-10 |
| 6753559 |
Transistor having improved gate structure |
Amitava Chatterjee, Greg Hames, Qizhi He, Maureen A. Hanratty, Iqbal Ali |
2004-06-22 |
| 6688344 |
Container flush and gas charge system and method |
Tain-Chen Hu, Ming-Te More |
2004-02-10 |
| 6635229 |
Method for low perfluorocarbon compound emission |
Albert Cheng, Qizhi He |
2003-10-21 |
| 6559050 |
Process for high thermal stable contact formation in manufacturing sub-quarter-micron CMOS devices |
William R. McKee, Jiong-Ping Lu, Ming-Jang Hwang, Dirk N. Anderson |
2003-05-06 |
| 6436746 |
Transistor having an improved gate structure and method of construction |
Amitava Chatterjee, Greg Hames, Qizhi He, Maureen A. Hanratty, Iqbal Ali |
2002-08-20 |
| 6383870 |
Semiconductor device architectures including UV transmissive nitride layers |
Kemal Tamer San, Cetin Kaya |
2002-05-07 |
| 6351039 |
Integrated circuit dielectric and method |
Changming Jin, Kelly Taylor |
2002-02-26 |
| 6307230 |
Transistor having an improved sidewall gate structure and method of construction |
Amitava Chatterjee, Greg Hames, Quzhi He, Iqbal Ali, Maureen A. Hanratty |
2001-10-23 |
| 6274900 |
Semiconductor device architectures including UV transmissive nitride layers |
Kemal Tamer San, Cetin Kaya |
2001-08-14 |
| 6214423 |
Method of forming a polymer on a surface |
Richard B. Timmons, Licheng M. Han |
2001-04-10 |
| 6117741 |
Method of forming a transistor having an improved sidewall gate structure |
Amitava Chatterjee, Greg Hames, Quzhi He, Iqbal Ali, Maureen A. Hanratty |
2000-09-12 |
| 6063692 |
Oxidation barrier composed of a silicide alloy for a thin film and method of construction |
Joseph D. Luttmer, Hong-Seon Yang |
2000-05-16 |
| 4657844 |
Plasma developable negative resist compositions for electron beam, X-ray and optical lithography |
Jing Shu, Johnny B. Covington, Larry G. Venable, Gilbert L. Varnell |
1987-04-14 |
| 4318976 |
High gel rigidity, negative electron beam resists |
Jing Shu, Gilbert L. Varnell, John L. Bartelt |
1982-03-09 |
