Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4657844 | Plasma developable negative resist compositions for electron beam, X-ray and optical lithography | Jing Shu, Johnny B. Covington, Wei William Lee, Larry G. Venable | 1987-04-14 |
| 4318976 | High gel rigidity, negative electron beam resists | Jing Shu, Wei William Lee, John L. Bartelt | 1982-03-09 |