| 10550464 |
Physical vapor deposition method using backside gas cooling of workpieces |
Harish V. PENMETHSA, Harshal T. Vasa, Srikanth Dasaradhi, Lee LaBlanc |
2020-02-04 |
| 10053771 |
Physical vapor deposition system with target magnets controlled to only be above workpiece |
Manohar Korlapati |
2018-08-21 |
| 9957606 |
Physical vapor deposition system using rotating pallet with X and Y positioning |
Srikanth Dasaradhi, Lee LaBlanc, Suresh Palanisamy, Venkata Dora Chowdary Kakarla |
2018-05-01 |
| 9932668 |
Physical vapor deposition system using backside gas cooling of workpieces |
Harish V. PENMETHSA, Harshal T. Vasa, Srikanth Dasaradhi, Lee LeBlanc |
2018-04-03 |
| 8105466 |
Biased pulse DC reactive sputtering of oxide films |
Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray |
2012-01-31 |
| 8092659 |
Multi-station sputtering and cleaning system |
Dean Smith, Edward Strepka, Srikanth Dasaradhi |
2012-01-10 |
| 7799190 |
Target backing plate for sputtering system |
Dean Smith, Srikanth Dasaradhi |
2010-09-21 |
| 7794574 |
Top shield for sputtering system |
Dean Smith, Srikanth Dasaradhi |
2010-09-14 |
| 7785455 |
Cross-contaminant shield in sputtering system |
Dean Smith |
2010-08-31 |
| 7744730 |
Rotating pallet in sputtering system |
Edward Strepka |
2010-06-29 |
| 7682495 |
Oscillating magnet in sputtering system |
Dean Smith, Srikanth Dasaradhi |
2010-03-23 |
| 7544276 |
Biased pulse DC reactive sputtering of oxide films |
Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray |
2009-06-09 |
| 7479210 |
Temperature control of pallet in sputtering system |
Dean Smith, Edward Strepka |
2009-01-20 |
| 7469558 |
As-deposited planar optical waveguides with low scattering loss and methods for their manufacture |
Richard E. Demaray, Kai-An Wang, Qing Zhu, Hongmei Zhang, Harold Ackler +2 more |
2008-12-30 |
| 7413998 |
Biased pulse DC reactive sputtering of oxide films |
Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray |
2008-08-19 |
| 7381657 |
Biased pulse DC reactive sputtering of oxide films |
Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray |
2008-06-03 |
| 7378356 |
Biased pulse DC reactive sputtering of oxide films |
Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray |
2008-05-27 |
| 6827826 |
Planar optical devices and methods for their manufacture |
Richard E. Demaray, Kai-An Wang, Douglas P. Stadtler, Hongmei Zhang, Rajiv Pethe |
2004-12-07 |
| 6533907 |
Method of producing amorphous silicon for hard mask and waveguide applications |
Richard E. Demaray, Jesse Shan, Kai-An Wang |
2003-03-18 |
| 6506289 |
Planar optical devices and methods for their manufacture |
Richard E. Demaray, Kai-An Wang, Douglas P. Stadtler, Hongmei Zhang, Rajiv Pethe |
2003-01-14 |
| 6257045 |
Automated substrate processing systems and methods |
Akihiro Hosokawa, Richard E. Demaray, Makoto Inagawa, Harlan L. Halsey, Michael T. Starr |
2001-07-10 |
| 6205870 |
Automated substrate processing systems and methods |
Akihiro Hosokawa, Richard E. Demaray, Makoto Inagawa, Harlan L. Halsey, Michael T. Starr |
2001-03-27 |