Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10550464 | Physical vapor deposition method using backside gas cooling of workpieces | Harish V. PENMETHSA, Harshal T. Vasa, Srikanth Dasaradhi, Lee LaBlanc | 2020-02-04 |
| 10053771 | Physical vapor deposition system with target magnets controlled to only be above workpiece | Manohar Korlapati | 2018-08-21 |
| 9957606 | Physical vapor deposition system using rotating pallet with X and Y positioning | Srikanth Dasaradhi, Lee LaBlanc, Suresh Palanisamy, Venkata Dora Chowdary Kakarla | 2018-05-01 |
| 9932668 | Physical vapor deposition system using backside gas cooling of workpieces | Harish V. PENMETHSA, Harshal T. Vasa, Srikanth Dasaradhi, Lee LeBlanc | 2018-04-03 |
| 8105466 | Biased pulse DC reactive sputtering of oxide films | Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray | 2012-01-31 |
| 8092659 | Multi-station sputtering and cleaning system | Dean Smith, Edward Strepka, Srikanth Dasaradhi | 2012-01-10 |
| 7799190 | Target backing plate for sputtering system | Dean Smith, Srikanth Dasaradhi | 2010-09-21 |
| 7794574 | Top shield for sputtering system | Dean Smith, Srikanth Dasaradhi | 2010-09-14 |
| 7785455 | Cross-contaminant shield in sputtering system | Dean Smith | 2010-08-31 |
| 7744730 | Rotating pallet in sputtering system | Edward Strepka | 2010-06-29 |
| 7682495 | Oscillating magnet in sputtering system | Dean Smith, Srikanth Dasaradhi | 2010-03-23 |
| 7544276 | Biased pulse DC reactive sputtering of oxide films | Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray | 2009-06-09 |
| 7479210 | Temperature control of pallet in sputtering system | Dean Smith, Edward Strepka | 2009-01-20 |
| 7469558 | As-deposited planar optical waveguides with low scattering loss and methods for their manufacture | Richard E. Demaray, Kai-An Wang, Qing Zhu, Hongmei Zhang, Harold Ackler +2 more | 2008-12-30 |
| 7413998 | Biased pulse DC reactive sputtering of oxide films | Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray | 2008-08-19 |
| 7381657 | Biased pulse DC reactive sputtering of oxide films | Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray | 2008-06-03 |
| 7378356 | Biased pulse DC reactive sputtering of oxide films | Hongmei Zhang, Mukundan Narasimhan, Richard E. Demaray | 2008-05-27 |
| 6827826 | Planar optical devices and methods for their manufacture | Richard E. Demaray, Kai-An Wang, Douglas P. Stadtler, Hongmei Zhang, Rajiv Pethe | 2004-12-07 |
| 6533907 | Method of producing amorphous silicon for hard mask and waveguide applications | Richard E. Demaray, Jesse Shan, Kai-An Wang | 2003-03-18 |
| 6506289 | Planar optical devices and methods for their manufacture | Richard E. Demaray, Kai-An Wang, Douglas P. Stadtler, Hongmei Zhang, Rajiv Pethe | 2003-01-14 |
| 6257045 | Automated substrate processing systems and methods | Akihiro Hosokawa, Richard E. Demaray, Makoto Inagawa, Harlan L. Halsey, Michael T. Starr | 2001-07-10 |
| 6205870 | Automated substrate processing systems and methods | Akihiro Hosokawa, Richard E. Demaray, Makoto Inagawa, Harlan L. Halsey, Michael T. Starr | 2001-03-27 |