Issued Patents All Time
Showing 26–50 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10083872 | Methods for forming Fin field-effect transistors | Ryan Chia-Jen Chen, Chia Tai Lin, Chao-Cheng Chen | 2018-09-25 |
| 10038095 | V-shape recess profile for embedded source/drain epitaxy | Chii-Horng Li, Chih-Shan Chen, Roger Tai, Yen-Ru Lee, Tzu-Ching Lin | 2018-07-31 |
| 9960160 | Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process | Ryan Chia-Jen Chen, Donald Y. Chao, Yi-Shien Mor, Kuo-Tai Huang | 2018-05-01 |
| 9934971 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Ming-Ching Chang, Chun-Hung Lee, De-Fang Chen, Chao-Cheng Chen | 2018-04-03 |
| 9825173 | FinFET device | Chia Tai Lin, An-Shen Chang, Ryan Chia-Jen Chen, Chao-Cheng Chen | 2017-11-21 |
| 9640398 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Ming-Ching Chang, Chun-Hung Lee, De-Fang Chen, Chao-Cheng Chen | 2017-05-02 |
| 9633905 | Semiconductor fin structures and methods for forming the same | Ryan Chia-Jen Chen, Chia Tai Lin, Chao-Cheng Chen | 2017-04-25 |
| 9601388 | Integrated high-K/metal gate in CMOS process flow | Ryan Chia-Jen Chen, Jr-Jung Lin, Chien-Hao Chen, Yi-Hsing Chen, Kuo-Tai Huang +1 more | 2017-03-21 |
| 9601333 | Etching process | Ming-Hsi Yeh, Bi-Ming Yen, Chao-Cheng Chen, Syun-Ming Jang | 2017-03-21 |
| 9349839 | FinFET device structure and methods of making same | Yu-Chao Lin, Ryan Chia-Jen Chen, Chao-Cheng Chen | 2016-05-24 |
| 9257426 | Integrated high-k/metal gate in CMOS process flow | Ryan Chia-Jen Chen, Yi-Shien Mor, Yi-Hsing Chen, Kuo-Tai Huang, Chien-Hao Chen +1 more | 2016-02-09 |
| 9190496 | Method of making a FinFET device | Chia Tai Lin, An-Shen Chang, Ryan Chia-Jen Chen, Chao-Cheng Chen | 2015-11-17 |
| 9153440 | Method of forming a semiconductor device | Chih-Han Lin, Ming-Ching Chang, Ryan Chia-Jen Chen, Jr-Jung Lin | 2015-10-06 |
| 9059085 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Chang Ming-Ching, Chun-Hung Lee, De-Fang Chen, Chao-Cheng Chen | 2015-06-16 |
| 8946014 | FinFET device structure and methods of making same | Yu-Chao Lin, Ryan Chia-Jen Chen, Chao-Cheng Chen | 2015-02-03 |
| 8911559 | Method to pre-heat and stabilize etching chamber condition and improve mean time between cleaning | Yu-Chao Lin, Ryan Chia-Jen Chen, Jr-Jung Lin | 2014-12-16 |
| 8841731 | Integrated high-k/metal gate in CMOS process flow | Ryan Chia-Jen Chen, Jr-Jung Lin, Yi-Shien Mor, Chien-Hao Chen, Kuo-Tai Huang +1 more | 2014-09-23 |
| 8791001 | N2 based plasma treatment and ash for HK metal gate protection | Yu-Chao Lin, Ryan Chia-Jen Chen, Jr-Jung Lin | 2014-07-29 |
| 8772183 | Method of forming an integrated circuit | Tzu-Yen Hsieh, Chang Ming-Ching, Chun-Hung Lee, De-Fang Chen, Chao-Cheng Chen | 2014-07-08 |
| 8551837 | Methods of fabricating high-K metal gate devices | Ryan Chia-Jen Chen, Chien-Hao Chen, Kuo-Tai Huang, Yi-Hsing Chen, Jr-Jung Lin +1 more | 2013-10-08 |
| 8524588 | Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process | Ryan Chia-Jen Chen, Donald Y. Chao, Yi-Shien Mor, Kuo-Tai Huang | 2013-09-03 |
| 8383502 | Integrated high-K/metal gate in CMOS process flow | Ryan Chia-Jen Chen, Jr-Jung Lin, Yi-Shien Mor, Chien-Hao Chen, Kuo-Tai Huang +1 more | 2013-02-26 |
| 8304349 | Method to integrate gate etching as all-in-one process for high K metal gate | Jr-Jung Lin, Ryan Chia-Jen Chen | 2012-11-06 |
| 8273632 | Patterning methodology for uniformity control | Yu-Chao Lin, Ming-Ching Chang, Ryan Chia-Jen Chen, Chao-Cheng Chen | 2012-09-25 |
| 8258588 | Sealing layer of a field effect transistor | Yu-Chao Lin, Jr-Jung Lin, Jih-Jse Lin, Chao-Cheng Chen, Ryan Chia-Jen Chen +1 more | 2012-09-04 |