Issued Patents All Time
Showing 51–75 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9304390 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-04-05 |
| 9285671 | Mask for use in lithography | Shinn-Sheng Yu, Anthony Yen | 2016-03-15 |
| 9280046 | Method of fabricating mask | Anthony Yen, Chih-Tsung Shih, Ming-Jiun Yao, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-03-08 |
| 9261774 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-02-16 |
| 9252048 | Metal and via definition scheme | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-02-02 |
| 9244366 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-01-26 |
| 9229326 | Method for integrated circuit patterning | Shu-Hao Chang, Shinn-Sheng Yu, Jui-Ching Wu, Jeng-Horng Chen, Anthony Yen | 2016-01-05 |
| 9223197 | Lithography and mask for resolution enhancement | Shinn-Sheng Yu, Anthony Yen | 2015-12-29 |
| 9195135 | Method for mask fabrication and repair | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-11-24 |
| 9182659 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-11-10 |
| 9146459 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-09-29 |
| 9122166 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-09-01 |
| 9116435 | Extreme ultraviolet lithography mask | Shinn-Sheng Yu, Anthony Yen | 2015-08-25 |
| 9091947 | Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-07-28 |
| 9081288 | Extreme ultraviolet (EUV) mask, method of fabricating the EUV mask and method of inspecting the EUV mask | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-07-14 |
| 9081312 | Method to define multiple layer patterns with a single exposure by E-beam lithography | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-07-14 |
| 9075313 | Multiple exposures in extreme ultraviolet lithography | Shinn-Sheng Yu, Anthony Yen | 2015-07-07 |
| 9034569 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2015-05-19 |
| 8841047 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Anthony Yen | 2014-09-23 |
| 8828625 | Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same | Shinn-Sheng Yu, Anthony Yen | 2014-09-09 |
| 8791024 | Method to define multiple layer patterns using a single exposure | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2014-07-29 |
| 8785084 | Method for mask fabrication and repair | Shinn-Sheng Yu, Anthony Yen | 2014-07-22 |
| 8765330 | Phase shift mask for extreme ultraviolet lithography and method of fabricating same | Chia-Tsung Shih, Pei-Chung Hsu, Shinn-Sheng Yu, Tsiao-Chen Wu, Shu-Hao Chang +3 more | 2014-07-01 |
| 8628897 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Anthony Yen | 2014-01-14 |
| 7875478 | Method for controlling color contrast of a multi-wavelength light-emitting diode | Dong-Ming Yeh, Horng-Shyang Chen, Chih-Feng Lu, Chi-Feng Huang, Tsung-Yi Tang +4 more | 2011-01-25 |