Issued Patents All Time
Showing 176–200 of 205 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9123563 | Method of forming contact structure of gate structure | Audrey Hsiao-Chiu Hsu, Fu-Kai Yang, Hsien-Cheng Wang, Shih-Wen Liu, Hsin-Ying Lin | 2015-09-01 |
| 9093299 | Semiconductor arrangement and formation thereof | Shih-Wen Liu, Hsien-Cheng Wang, Fu-Kai Yang, Hsiao-Chiu Hsu, Hsin-Ying Lin | 2015-07-28 |
| 8791528 | Methods of manufacturing metal-silicide features | Chen-Tung Lin, Chih-Wei Chang, Chii-Ming Wu, Chaing-Ming Chuang, Shau-Lin Shue | 2014-07-29 |
| 8536010 | Method for making a disilicide | Chun-Wen Nieh, Hung-Chang Hsu, Wen-Chi Tsai, Chii-Ming Wu, Wei-Jung Lin +1 more | 2013-09-17 |
| 8304319 | Method for making a disilicide | Chun-Wen Nieh, Hung-Chang Hsu, Wen-Chi Tsai, Chii-Ming Wu, Wei-Jung Lin +1 more | 2012-11-06 |
| 8202799 | Methods of manufacturing metal-silicide features | Chen-Tung Lin, Chih-Wei Chang, Chii-Ming Wu, Chaing-Ming Chuang, Shau-Lin Shue | 2012-06-19 |
| 7795119 | Flash anneal for a PAI, NiSi process | Chia Ping Lo, Jerry Lai, Chii-Ming Wu, Da-Wen Lin | 2010-09-14 |
| 7795644 | Integrated circuits with stress memory effect and fabrication methods thereof | Cheng-Chen Calvin Hsueh, Wu-An Weng | 2010-09-14 |
| 7781316 | Methods of manufacturing metal-silicide features | Chen-Tung Lin, Chih-Wei Chang, Chii-Ming Wu, Chiang-Ming Chuang, Shau-Lin Shue | 2010-08-24 |
| 7678694 | Method for fabricating semiconductor device with silicided gate | Cheng-Chen Calvin Hsueh | 2010-03-16 |
| 7514348 | Sidewall coverage for copper damascene filling | Shau-Lin Shue, Chen-Hua Yu | 2009-04-07 |
| 7396767 | Semiconductor structure including silicide regions and method of making same | Chii-Ming Wu, Cheng-Tung Lin, Chih-Wei Chang, Shau-Lin Shue | 2008-07-08 |
| 7282450 | Sidewall coverage for copper damascene filling | Shau-Lin Shue, Chen-Hua Yu | 2007-10-16 |
| 7268065 | Methods of manufacturing metal-silicide features | Chen-Tung Lin, Chih-Wei Chang, Chii-Ming Wu, Chiang-Ming Chuang, Shau-Lin Shue | 2007-09-11 |
| 7247915 | Cobalt/nickel bi-layer silicide process for very narrow line polysilicon gate technology | Chih-Wei Chang, Shau-Lin Shue, Mong-Song Liang | 2007-07-24 |
| 7205234 | Method of forming metal silicide | Chii-Ming Wu, Chih-Wei Chang, Shau-Lin Shue | 2007-04-17 |
| 7105439 | Cobalt/nickel bi-layer silicide process for very narrow line polysilicon gate technology | Chih-Wei Chang, Shau-Lin Shue, Mong-Song Liang | 2006-09-12 |
| 7015126 | Method of forming silicided gate structure | Chii-Ming Wu, Cheng-Tung Lin, Chih-Wei Chang, Shau-Lin Shue | 2006-03-21 |
| 6884669 | Hatted polysilicon gate structure for improving salicide performance and method of forming the same | Chih-Wei Chang | 2005-04-26 |
| 6884736 | Method of forming contact plug on silicide structure | Chii-Ming Wu, Chih-Wei Chang, Chin-Hwa Hsieh, Shau-Lin Shue, Chu-Yun Fu +3 more | 2005-04-26 |
| 6864143 | Eliminate bridging between gate and source/drain in cobalt salicidation | Shau-Lin Shue | 2005-03-08 |
| 6849543 | Cobalt silicide formation method employing wet chemical silicon substrate oxidation | Chih-Wei Chang, Shau-Lin Shue, Ching-Hau Hsieh | 2005-02-01 |
| 6686280 | Sidewall coverage for copper damascene filling | Shau-Lin Shue, Chen-Hua Yu | 2004-02-03 |
| 6589836 | One step dual salicide formation for ultra shallow junction applications | Chih-Wei Chang | 2003-07-08 |
| 6531389 | Method for forming incompletely landed via with attenuated contact resistance | Shau-Lin Shue | 2003-03-11 |