Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12066760 | Reticle-masking structure, extreme ultra violet apparatus, and method of forming the same | Ching-Hsiang Hsu, Feng Yuan Hsu | 2024-08-20 |
| 11999027 | Method for polishing semiconductor substrate | He Hui Peng, Jiann Lih Wu, Chi-Ming Yang | 2024-06-04 |
| 11772227 | Device and methods for chemical mechanical polishing | He Hui Peng, Jiann Lih Wu, Chi-Ming Yang | 2023-10-03 |
| 11602821 | Wafer polishing head, system thereof, and method using the same | He Hui Peng, Jiann Lih Wu, Chi-Ming Yang | 2023-03-14 |
| 11287745 | Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same | Ching-Hsiang Hsu, Feng Yuan Hsu | 2022-03-29 |
| 10875143 | Apparatus and methods for chemical mechanical polishing | Jiann Lih Wu, He Hui Peng, Chi-Ming Yang | 2020-12-29 |
| 10875148 | Apparatus and methods for chemical mechanical polishing | He Hui Peng, Chi-Ming Yang, Yung-Yao Lee, Yen-Di Tsen | 2020-12-29 |
| 10866519 | Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same | Ching-Hsiang Hsu, Feng Yuan Hsu | 2020-12-15 |
| 10513006 | High throughput CMP platform | Jiann Lih Wu, Jason Shen, Soon-Kang Huang, Chi-Ming Yang | 2019-12-24 |
| 10507498 | Apparatus for particle cleaning | Ying-Hsueh Chang Chien, Chi-Ming Yang | 2019-12-17 |
| 10065288 | Chemical mechanical polishing (CMP) platform for local profile control | Jiann Lih Wu, Chi-Ming Yang | 2018-09-04 |
| 9403254 | Methods for real-time error detection in CMP processing | Bo-I Lee, Chi-Ming Yang, Chin-Hsiang Lin | 2016-08-02 |
| 8394156 | Ultra-pure air system for nano wafer environment | Tzu-Sou Chuang | 2013-03-12 |