HW

Hsien-Cheng Wang

TSMC: 41 patents #828 of 12,232Top 7%
Overall (All Time): #76,050 of 4,157,543Top 2%
41
Patents All Time

Issued Patents All Time

Showing 26–41 of 41 patents

Patent #TitleCo-InventorsDate
9425048 Mechanisms for semiconductor device structure Hsin-Ying Lin, Mei-Yun Wang, Fu-Kai Yang, Shih-Wen Liu, Audrey Hsiao-Chiu Hsu 2016-08-23
9331173 Semiconductor device having a carbon containing insulation layer formed under the source/drain Shih-Wen Liu, Mei-Yun Wang, Fu-Kai Yang, Hsiao-Chiu Hsu, Hsin-Ying Lin 2016-05-03
9318488 Semiconductor device and formation thereof I-Wen Wu, Mei-Yun Wang, Shih-Wen Liu, Hsiao-Chiu Hsu, Hsin-Ying Lin 2016-04-19
9312259 Integrated circuit structure with thinned contact Hsin-Ying Lin, Mei-Yun Wang, Shih-Wen Liu, Fu-Kai Yang, Audrey Hsiao-Chiu Hsu 2016-04-12
9299657 Semiconductor device and method for manufacturing semiconductor device Audrey Hsiao-Chiu Hsu, Fu-Kai Yang, Mei-Yun Wang, Shih-Wen Liu, Hsin-Ying Lin 2016-03-29
9280041 Cross quadrupole double lithography method using two complementary apertures Hung-Chang Hsieh, Shih-Che Wang, Ping-Chieh Wu, Wen-Chun Huang, Ming-Chang Wen 2016-03-08
9214347 Overlay mark assistant feature Hsin-Chieh Yao, Huang Chien Kai, Chun-Kuang Chen 2015-12-15
9123563 Method of forming contact structure of gate structure Audrey Hsiao-Chiu Hsu, Fu-Kai Yang, Mei-Yun Wang, Shih-Wen Liu, Hsin-Ying Lin 2015-09-01
9093299 Semiconductor arrangement and formation thereof Shih-Wen Liu, Mei-Yun Wang, Fu-Kai Yang, Hsiao-Chiu Hsu, Hsin-Ying Lin 2015-07-28
9000525 Structure and method for alignment marks Ming-Chang Wen, Chun-Kuang Chen 2015-04-07
8848163 Photoresist materials and photolithography processes Chin-Hsiang Lin, Heng-Jen Lee, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin 2014-09-30
8513821 Overlay mark assistant feature Hsin-Chieh Yao, Chien-Kai Huang, Chun-Kuang Chen 2013-08-20
8507177 Photoresist materials and photolithography processes Chin-Hsiang Lin, Heng-Jen Lee, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin 2013-08-13
8416393 Cross quadrupole double lithography method and apparatus for semiconductor device fabrication using two apertures Hung-Chang Hsieh, Shih-Che Wang, Ping-Chieh Wu, Wen-Chun Huang, Ming-Chang Wen 2013-04-09
8098364 Exposure apparatus and method for photolithography process Vinvent Yu, Hung-Chang Hsieh 2012-01-17
7972761 Photoresist materials and photolithography process Chin-Hsiang Lin, H. J. Lee, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin 2011-07-05