Issued Patents All Time
Showing 201–225 of 235 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9048181 | Mechanisms for forming ultra shallow junction | Chii-Ming Wu, Yu-Lien Huang | 2015-06-02 |
| 9029226 | Mechanisms for doping lightly-doped-drain (LDD) regions of finFET devices | Tsan-Chun Wang, Su-Hao Liu | 2015-05-12 |
| 9029912 | Semiconductor substructure having elevated strain material-sidewall interface and method of making the same | Wei-Yang Lee, Yuan-Ching Peng | 2015-05-12 |
| 9012310 | Epitaxial formation of source and drain regions | Yi-Fang Pai | 2015-04-21 |
| 9012315 | Methods and systems for dopant activation using microwave radiation | Yan-Ting Lin, Cheng-Yan Zhan, Yi-Tang Lin, Clement Hsingjen Wann | 2015-04-21 |
| 8993417 | FinFET fin bending reduction | Shiang-Rung Tsai | 2015-03-31 |
| 8987099 | Structure and method for thermal treatment with epitaxial SiCP thermal stability improvement | Su-Hao Liu, Tsan-Chun Wang | 2015-03-24 |
| 8980719 | Methods for doping fin field-effect transistors | Yu-Lien Huang, De-Wei Yu | 2015-03-17 |
| 8945971 | Wafer warpage reduction | Shiang-Rung Tsai | 2015-02-03 |
| 8916428 | Method of forming a semiconductor device | Tsan-Chun Wang | 2014-12-23 |
| 8906789 | Asymmetric cyclic desposition etch epitaxy | Yi-Fang Pai, Chien-Chang Su, Tzu-Chun TSENG, Meng-Yueh Liu | 2014-12-09 |
| 8900958 | Epitaxial formation mechanisms of source and drain regions | Meng-Yueh Liu | 2014-12-02 |
| 8884341 | Integrated circuits | Su-Hao Liu, Chien-Tai Chan, King-Yuen Wong, Chien-Chang Su | 2014-11-11 |
| 8883522 | System for semiconductor device characterization using reflectivity measurement | Sheng-Wen Yu, De-Wei Yu | 2014-11-11 |
| 8877592 | Epitaxial growth of doped film for source and drain regions | Jian-An Ke, Tsan-Yao Chen, Chin-Kun Wang | 2014-11-04 |
| 8877602 | Mechanisms of doping oxide for forming shallow trench isolation | Yu-Lien Huang, Chii-Ming Wu, Ziwei Fang | 2014-11-04 |
| 8853039 | Defect reduction for formation of epitaxial layer in source and drain regions | Tsz-Mei Kwok, Chien-Chang Su | 2014-10-07 |
| 8809175 | Methods of anneal after deposition of gate layers | Xiong-Fei Yu, Yu-Lien Huang, Da-Wen Lin | 2014-08-19 |
| 8785286 | Techniques for FinFET doping | Chien-Tai Chan, Mao-Rong Yeh, Da-Wen Lin | 2014-07-22 |
| 8753904 | Method and system for semiconductor device pattern loading effect characterization | Sheng-Wen Yu, De-Wei Yu | 2014-06-17 |
| 8753980 | Rapid thermal annealing to reduce pattern effect | Chii-Ming Wu, Da-Wen Lin | 2014-06-17 |
| 8735266 | Mechanisms for forming ultra shallow junction | Chii-Ming Wu, Yu-Lien Huang | 2014-05-27 |
| 8723266 | Pinch-off control of gate edge dislocation | Tsan-Chun Wang | 2014-05-13 |
| 8703593 | Techniques for FinFET doping | Chien-Tai Chan, Mao-Rong Yeh, Da-Wen Lin | 2014-04-22 |
| 8674453 | Mechanisms for forming stressor regions in a semiconductor device | Tsan-Chun Wang, Su-Hao Liu, Tsz-Mei Kwok, Chii-Meng Wu | 2014-03-18 |