Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7317221 | High density MIM capacitor structure and fabrication process | Kuan-Lun Chang, Chuan-Ying Lee | 2008-01-08 |
| 7294544 | Method of making a metal-insulator-metal capacitor in the CMOS process | Yen-Shih Ho, Jau-Yuann Chung, Hun-Jan Tao | 2007-11-13 |
| 7122878 | Method to fabricate high reliable metal capacitor within copper back-end process | Chi-Feng Huang, Shy-Chy Wong, Chih-Hsien Lin | 2006-10-17 |
| 7050290 | Integrated capacitor | Denny Tang, Wen-Chin Lin, Li-Shyue Lai, Chung-Long Chang | 2006-05-23 |
| 7035083 | Interdigitated capacitor and method for fabrication thereof | Wen-Chin Lin, Denny Tang, Li-Shyue Lai, Chung-Long Chang | 2006-04-25 |
| 6949781 | Metal-over-metal devices and the method for manufacturing same | Chung-Long Chang | 2005-09-27 |
| 6916722 | Method to fabricate high reliable metal capacitor within copper back-end process | Chi-Feng Huang, Shy-Chy Wong, Chih-Hsien Lin | 2005-07-12 |
| 6881996 | Metal-insulator-metal (MIM) capacitor structure in copper-CMOS circuits using a pad protect layer | Ssu-Pin Ma, Ta-Hsun Yeh, Yen-Shih Ho, Kuo-Reay Peng, Heng-Ming Hsu +2 more | 2005-04-19 |
| 6812088 | Method for making a new metal-insulator-metal (MIM) capacitor structure in copper-CMOS circuits using a pad protect layer | Ssu-Pin Ma, Ta-Hsun Yeh, Yen-Shih Ho, Kuo-Reay Peng, Heng-Ming Hsu +2 more | 2004-11-02 |
| 6734079 | Microelectronic fabrication having sidewall passivated microelectronic capacitor structure fabricated therein | Chi-Feng Huang, Shyh-Chyi Wang, Chih-Hsien Lin, Tien-I Bao, Syun-Ming Jang | 2004-05-11 |
| 6667217 | Method of fabricating a damascene copper inductor structure using a sub-0.18 um CMOS process | Heng-Ming Hsu, Jau-Yuann Chung, Yen-Shih Ho, Kuo-Reay Peng, Ta-Hsun Yeh +2 more | 2003-12-23 |
| 6583491 | Microelectronic fabrication having microelectronic capacitor structure fabricated therein | Chi-Feng Huang | 2003-06-24 |
| 6472721 | Dual damascene interconnect structures that include radio frequency capacitors and inductors | Ssu-Pin Ma, Ta-Hsun Yeh, Kuo-Reay Peng, Heng-Ming Hsu, Kong-Beng Thei +2 more | 2002-10-29 |
| 6329234 | Copper process compatible CMOS metal-insulator-metal capacitor structure and its process flow | Ssu-Pin Ma, Ta-Hsun Yeh, Kuo-Reay Peng, Heng-Ming Hsu, Kong-Beng Thei +2 more | 2001-12-11 |
| 6051475 | Method for manufacturing a silicide to silicide capacitor | Yen-Shih Ho | 2000-04-18 |
| 5880040 | Gate dielectric based on oxynitride grown in N.sub.2 O and annealed in NO | Shi-Chung Sun, Lee-Wei Yen, Chun-Jung Lin | 1999-03-09 |