Issued Patents All Time
Showing 26–50 of 116 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11914288 | Photomask having recessed region | Yu-Yu Chen | 2024-02-27 |
| 11899377 | System and method for thermal management of reticle in semiconductor manufacturing | Yueh-Lin Yang | 2024-02-13 |
| 11899378 | Lithography system and operation method thereof | Min-Cheng Wu | 2024-02-13 |
| 11809084 | Radiation source supply system for lithographic tools | Yueh-Lin Yang | 2023-11-07 |
| 11703761 | Temperature controlling apparatus | Wei Chang Cheng | 2023-07-18 |
| 11687012 | Reduce mask defect impact by contamination decompose | Po-Ming SHIH | 2023-06-27 |
| 11675264 | Reticle cleaning system | Wei Chang Cheng | 2023-06-13 |
| 11599026 | Dispensing nozzle design and dispensing method thereof | Wei Chang Cheng | 2023-03-07 |
| 11579539 | Method and apparatus for improving critical dimension variation | Ming-Hsun LIN, Yu-Hsiang Ho, Jhun Hua Chen, Teng Kuei Chuang | 2023-02-14 |
| 11562898 | Cleaning method and apparatus | Min-Cheng Wu | 2023-01-24 |
| 11561482 | Methods and apparatus for reducing hydrogen permeation from lithographic tool | Po-Ming SHIH | 2023-01-24 |
| 11550233 | Lithography system and operation method thereof | Min-Cheng Wu | 2023-01-10 |
| 11513083 | Photolithography method and photolithography system | Wei Chang Cheng | 2022-11-29 |
| 11508602 | Cleaning tool | Yueh-Lin Yang | 2022-11-22 |
| 11448955 | Mask for lithography process and method for manufacturing the same | Yueh-Lin Yang | 2022-09-20 |
| 11435669 | Radiation source supply system for lithographic tools | Yueh-Lin Yang | 2022-09-06 |
| 11409201 | Substrate measuring device and a method of using the same | Min-Cheng Wu | 2022-08-09 |
| 11409200 | Substrate measuring device and a method of using the same | Min-Cheng Wu | 2022-08-09 |
| 11367644 | System and method for correcting non-ideal wafer topography | Cheng-Mu Lin, Yi-Ming Dai, Yueh-Lin Yang | 2022-06-21 |
| 11302566 | Wafer table with dynamic support pins | Min-Cheng Wu | 2022-04-12 |
| 11287751 | System and method for lens heating control | Yueh-Lin Yang | 2022-03-29 |
| 11269261 | Particle removal from wafer table and photomask | Min-Cheng Wu | 2022-03-08 |
| 11256181 | Apparatus and method for removing particles in semiconductor manufacturing | Yueh-Lin Yang | 2022-02-22 |
| 11243478 | System and method for thermal management of reticle in semiconductor manufacturing | Yueh-Lin Yang | 2022-02-08 |
| 11237483 | Method and apparatus for controlling droplet in extreme ultraviolet light source | Yueh-Lin Yang | 2022-02-01 |