Issued Patents All Time
Showing 51–75 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5198326 | Process for forming fine pattern | Kazuhiko Hashimoto | 1993-03-30 |
| 5191465 | Optical apparatus for alignment of reticle and wafer in exposure apparatus | Kazuhiro Yamashita | 1993-03-02 |
| 5186788 | Fine pattern forming method | Kazuhiko Hashimoto, Kazuhiro Yamashita | 1993-02-16 |
| 5169494 | Fine pattern forming method | Kazuhiko Hashimoto, Taichi Koizumi, Kenji Kawakita | 1992-12-08 |
| 5102688 | Fine pattern forming process | Kazuhiko Hashimoto | 1992-04-07 |
| 5093224 | Process for producing fine patterns using cyclocarbosilane | Kazuhiko Hashimoto, Kenji Kawakita | 1992-03-03 |
| 5057689 | Scanning electron microscope and a method of displaying cross sectional profiles using the same | Hideo Nakagawa, Taichi Koizumi, Kenji Harafuji, Mitsuhiro Okuni, Norimichi Anazawa | 1991-10-15 |
| RE33669 | Aligning exposure method | Koichi Kugimiya, Takayoshi Matsumura, Taketoshi Yonezawa | 1991-08-20 |
| 5030549 | Fine pattern forming method | Kazuhiko Hashimoto, Taichi Koizumi, Kenji Kawakita | 1991-07-09 |
| 4996123 | Optically oriented photoresist pattern forming method using organic crystal in photoresist layer with specified refracting indices formula | Atsushi Ueno, Kazuhiko Hashimoto, Satoshi Kinoshita | 1991-02-26 |
| 4976818 | Fine pattern forming method | Kazuhiko Hashimoto, Taichi Koizumi, Kenji Kawakita | 1990-12-11 |
| 4948238 | Optical projection system | Nobuhiro Araki, Takeo Sato, Koichi Kawata, Keisuke Koga | 1990-08-14 |
| 4936951 | Method of reducing proximity effect in electron beam resists | Kazuhiko Hashimoto, Taichi Koizumi, Kenji Kawakita | 1990-06-26 |
| 4870289 | Apparatus for controlling relation in position between a photomask and a wafer | Takeo Sato, Shinichiro Aoki, Katsumasa Yamaguchi, Tadashi Kaneko, Keisuke Koga +1 more | 1989-09-26 |
| 4861148 | Projection optical system for use in precise copy | Takeo Sato, Nobuhiro Araki, Koichi Kawata, Atushi Ueno, Shotaro Yoshida | 1989-08-29 |
| 4828392 | Exposure apparatus | Kazuhiro Yamashita, Takayoshi Matsumura, Midori Yamaguchi | 1989-05-09 |
| 4771180 | Exposure apparatus including an optical system for aligning a reticle and a wafer | Kazuhiro Yamashita | 1988-09-13 |
| 4757354 | Projection optical system | Takeo Sato, Nobuhiro Araki, Koichi Kawata, Atsushi Ueno, Shotaro Yoshida | 1988-07-12 |
| 4745042 | Water-soluble photopolymer and method of forming pattern by use of the same | Masaru Sasago, Masayuki Endo, Kenichi Takeyama | 1988-05-17 |
| 4734345 | Semiconductor IC and method of making the same | Koichi Kugimiya | 1988-03-29 |
| 4685198 | Method of manufacturing isolated semiconductor devices | Kenji Kawakita, Toyoki Takemoto | 1987-08-11 |
| 4672496 | Magnetic head having electromechanical transducer disposed at one end thereof | Kenji Kanai, Nobuyuki Kaminaka, Yuuji Omata | 1987-06-09 |
| 4660113 | Magnetoresistive thin film head | Yasuharu Shimeki | 1987-04-21 |
| 4636077 | Aligning exposure method | Koichi Kugimiya, Takayoshi Matsumura, Taketoshi Yonezawa | 1987-01-13 |
| 4622613 | Thin film magnetic head | Kenji Kanai, Nobuyuki Kaminaka | 1986-11-11 |