Issued Patents All Time
Showing 51–75 of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6916594 | Overcoating composition for photoresist and method for forming photoresist pattern using the same | Jae Chang Jung, Seung Chan Moon, Ki Soo Shin | 2005-07-12 |
| 6866984 | ArF photoresist copolymers | Jae Chang Jung, Ki Ho Baik | 2005-03-15 |
| 6808859 | ArF photoresist copolymers | Jae Chang Jung, Ki Ho Baik | 2004-10-26 |
| 6632903 | Polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2003-10-14 |
| 6608158 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2003-08-19 |
| 6599844 | Method and forming fine patterns of semiconductor devices using passivation layers | Cha-Won Koh | 2003-07-29 |
| 6376632 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2002-04-23 |
| 6372935 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2002-04-16 |
| 6369181 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2002-04-09 |
| 6316162 | Polymer and a forming method of a micro pattern using the same | Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee +2 more | 2001-11-13 |
| 6312865 | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2001-11-06 |
| 6265130 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2001-07-24 |
| 6248847 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2001-06-19 |
| 6235448 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2001-05-22 |
| 6225020 | Polymer and a forming method of a micro pattern using the same | Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee +2 more | 2001-05-01 |
| 6165672 | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | Jae Chang Jung, Keun Kyu Kong, Ki Ho Baik | 2000-12-26 |
| 6156668 | Method for forming a fine pattern in a semiconductor device | Hyung Gi Kim, Myung-Soo Kim, Ki Ho Baik, Dae Hoon Lee, Jin Woong Kim +1 more | 2000-12-05 |
| 6143463 | Method and photoresist using a photoresist copolymer | Jae Chang Jung, Ki Ho Baik | 2000-11-07 |
| 6132926 | ArF photoresist copolymers | Jae Chang Jung, Ki Ho Baik | 2000-10-17 |
| 6087065 | Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same | Cha-Won Koh | 2000-07-11 |
| 6063896 | Copolymer for photoresist | Jae Chang Jung | 2000-05-16 |
| 5981142 | Photoresist copolymer | Jae Chang Jung, Hyung Gi Kim | 1999-11-09 |
| 5928820 | Method for measuring pattern line width during manufacture of a semiconductor device | Ki Yeop Park | 1999-07-27 |
| 5888698 | Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same | Cha-Won Koh | 1999-03-30 |
| 5843627 | Method for forming fine patterns of semiconductor device | — | 1998-12-01 |