Issued Patents All Time
Showing 176–200 of 396 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8835096 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Daisuke Domon | 2014-09-16 |
| 8828645 | Negative resist composition and patterning process | Akinobu Tanaka, Keiichi Masunaga, Daisuke Domon | 2014-09-09 |
| 8815491 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Daisuke Domon | 2014-08-26 |
| 8802351 | Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography | Luisa D. Bozano, Takayuki Nagasawa, Mark Hull Sherwood, Ratnam Sooriyakumaran, Linda Karin Sundberg | 2014-08-12 |
| 8797569 | Printing device, contents-providing system, and computer program | Makoto Matsuda, Kiyotaka Ohara, Kazuma Aoki | 2014-08-05 |
| 8761554 | Wavelength selective switch | Koji Matsumoto, Toshiro Okamura, Takeshi Yamazaki | 2014-06-24 |
| 8749810 | Contents providing system, printing apparatus, and program therefor | Kiyotaka Ohara, Makoto Matsuda, Kazuma Aoki | 2014-06-10 |
| 8709300 | Process for production of nickel oxide-stabilized zirconia composite oxide | Kyosuke Domae, Takeshi Usui, Tadashi Yasui | 2014-04-29 |
| 8691490 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | Masaki Ohashi, Youichi Ohsawa, Keiichi Masunaga, Takeshi Kinsho | 2014-04-08 |
| 8685629 | Resist pattern forming process | Keiichi Masunaga, Takeru Watanabe, Daisuke Domon | 2014-04-01 |
| 8642886 | Seal structure, electronic device, portable device, and seal method | Shingo Yamaguchi, Kohei Choraku, Shigehiro Fujii, Katsumi Adachi, Yoshito Fukata | 2014-02-04 |
| 8634129 | Wavelength selective switch | Koji Matsumoto, Toshiro Okamura, Takeshi Yamazaki | 2014-01-21 |
| 8632939 | Polymer, chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Jun Hatakeyama, Youichi Ohsawa, Daisuke Domon | 2014-01-21 |
| 8606104 | Wavelength selective switch | Takehiro Yoshida, Koji Matsumoto, Masato Narusawa, Hirofumi ETO | 2013-12-10 |
| 8603724 | Negative resist composition and patterning process | Akinobu Tanaka, Keiichi Masunaga, Daisuke Domon | 2013-12-10 |
| 8597868 | Negative resist composition and patterning process | Daisuke Domon, Keiichi Masunaga, Akinobu Tanaka | 2013-12-03 |
| 8592133 | Resist composition and patterning process | Akinobu Tanaka, Takeru Watanabe, Takeshi Kinsho | 2013-11-26 |
| 8586282 | Resist composition and patterning process | Akinobu Tanaka, Takeru Watanabe, Takeshi Kinsho | 2013-11-19 |
| 8563216 | Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process | Hiroki Yoshikawa | 2013-10-22 |
| 8564805 | Printing system and computer usable medium therefor | Kazuma Aoki, Kiyotaka Ohara, Makoto Matsuda, Masashi Suzuki | 2013-10-22 |
| 8557509 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition | Akinobu Tanaka, Keiichi Masunaga, Daisuke Domon | 2013-10-15 |
| 8546060 | Chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Akinobu Tanaka, Daisuke Domon | 2013-10-01 |
| 8531769 | Dispersion element, spectral device, and wavelength selective switch | Takehiro Yoshida, Toshiro Okamura | 2013-09-10 |
| 8501942 | Polymerizable monomers | Daisuke Domon | 2013-08-06 |
| 8470512 | Polymer, chemically amplified negative resist composition, and patterning process | Keiichi Masunaga, Akinobu Tanaka | 2013-06-25 |