Issued Patents All Time
Showing 51–75 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9201301 | Method for producing resist composition | Tsutomu Ogihara, Yusuke Biyajima, Taku Morisawa | 2015-12-01 |
| 9091925 | Method for forming silicon-containing resist underlayer film | Takao Yoshihara, Tsutomu Ogihara | 2015-07-28 |
| 8927192 | Production method of resist composition for lithography | Tsutomu Ogihara | 2015-01-06 |
| 8822128 | Production method of resist composition for lithography | Tsutomu Ogihara | 2014-09-02 |
| 8329376 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Takafumi Ueda | 2012-12-11 |
| 7910283 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2011-03-22 |
| 7855043 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Takafumi Ueda, Takeshi Asano | 2010-12-21 |
| 7678529 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2010-03-16 |
| 7585613 | Antireflection film composition, substrate, and patterning process | Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2009-09-08 |
| 7541134 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer | 2009-06-02 |
| 7485690 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer | 2009-02-03 |
| 7417104 | Porous film-forming composition, patterning process, and porous sacrificial film | Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2008-08-26 |
| 7402621 | Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Anaso, Masaru Sasago +1 more | 2008-07-22 |
| 7385021 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2008-06-10 |
| 7357961 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa, Masaru Sasago | 2008-04-15 |
| 7332446 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa +1 more | 2008-02-19 |
| 7303785 | Antireflective film material, and antireflective film and pattern formation method using the same | Tsutomu Ogihara, Takeshi Asano, Fujio Yagihashi | 2007-12-04 |
| 7202013 | Antireflective film material, and antireflective film and pattern formation method using the same | Tsutomu Ogihara, Takeshi Asano, Fujio Yagihashi | 2007-04-10 |
| 7163778 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | Jun Hatakeyama, Takafumi Ueda, Tsutomu Ogihara | 2007-01-16 |
| 7132473 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa +1 more | 2006-11-07 |
| 7126208 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Fujio Yagihashi, Yoshitaka Hamada, Hideo Nakagawa, Masaru Sasago | 2006-10-24 |
| 6680107 | Film forming composition, porous film and their preparation | Fujio Yagihashi, Akira Yamamoto | 2004-01-20 |
| 6211307 | Organopolysiloxane composition for forming fired film | Masaaki Yamaya | 2001-04-03 |
| 5466847 | Process for preparing hexamethylcyclotrisilazane | Toshio Shinohara, Akio Yokoo, Muneo Kudo, Kazuyuki Matsumura | 1995-11-14 |
| 5194627 | N-tert-butyldialkylsilylmaleimide and its manufacture | Toshio Shinohara | 1993-03-16 |