CK

Cha-Won Koh

Samsung: 32 patents #3,705 of 75,807Top 5%
HE Hynix (Hyundai Electronics): 15 patents #23 of 1,604Top 2%
SH Sk Hynix: 8 patents #946 of 4,849Top 20%
Overall (All Time): #45,550 of 4,157,543Top 2%
55
Patents All Time

Issued Patents All Time

Showing 26–50 of 55 patents

Patent #TitleCo-InventorsDate
7678650 Nonvolatile memory device and method of manufacturing the same Byung-Hong Chung, Sang-Gyun Woo, Jeong-Lim Nam, Seok-Hwan Oh, Jai-Hyuk Song +2 more 2010-03-16
7582899 Semiconductor device having overlay measurement mark and method of fabricating the same Sang-Gyun Woo, Seok-Hwan Oh, Gi-Sung Yeo, Hyun Jae Kang, Jang-Ho Shin 2009-09-01
7575855 Method of forming pattern Sang-Gyun Woo, Gi-Sung Yeo, Myoung-Ho Jung 2009-08-18
7560768 Nonvolatile memory device and method of manufacturing the same Byung-Hong Chung, Sang-Gyun Woo, Jeong-Lim Nam, Seok-Hwan Oh, Jai-Hyuk Song +2 more 2009-07-14
7540970 Methods of fabricating a semiconductor device Sang-Gyun Woo, Jeong-Lim Nam, Kyeong-Koo Chi, Seok-Hwan Oh, Gi-Sung Yeo +2 more 2009-06-02
7452825 Method of forming a mask structure and method of forming a minute pattern using the same Doo-Youl Lee, Han-ku Cho, Suk-Joo Lee, Gi-Sung Yeo, Sung-Gon Jung 2008-11-18
7387869 Method of forming pattern for semiconductor device Sang-Gyun Woo, Byeong-Soo Kim 2008-06-17
7329477 Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Sung-Eun Hong +3 more 2008-02-12
6984482 Top-coating composition for photoresist and process for forming fine pattern using the same Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Sung-Eun Hong +3 more 2006-01-10
6858371 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Soo Shin 2005-02-22
6833326 Method for forming fine patterns in semiconductor device Yoon-suk Hyun 2004-12-21
6770415 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2004-08-03
6764806 Over-coating composition for photoresist, and processes for forming photoresist patterns using the same Jae Chang Jung, Keun Kyu Kong, Jin-Soo Kim, Ki Ho Baik 2004-07-20
6699644 Process for forming a photoresist pattern comprising alkaline treatment Geun Su Lee, Hyeong Soo Kim, Jin-Soo Kim, Sung-Eun Hong, Jae Chang Jung +2 more 2004-03-02
6664031 Process for forming photoresist pattern by using gas phase amine treatment Jae Chang Jung, Jin-Soo Kim, Sung-Eun Hong, Keun Kyu Kong, Ki Ho Baik 2003-12-16
6630281 Photoresist composition for top-surface imaging processes by silylation Geun Su Lee, Ki Ho Baik 2003-10-07
6627378 Photoresist composition for top-surface imaging process by silylation 2003-09-30
6610616 Method for forming micro-pattern of semiconductor device Sung-Eun Hong, Min Ho Jung, Jin-Soo Kim, Geun Su Lee, Jae Chang Jung 2003-08-26
6599844 Method and forming fine patterns of semiconductor devices using passivation layers Cheol Kyu Bok 2003-07-29
6586619 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2003-07-01
6410670 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2002-06-25
6399272 Phenylenediamine derivative-type additive useful for a chemically amplified photoresist Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2002-06-04
6387589 Photoresist polymers and photoresist compositions containing the same Geun Su Lee, Ki Ho Baik 2002-05-14
6368771 Photoresist polymers and photoresist compositions containing the same Geun Su Lee, Jae Chang Jung, Myoung Soo Kim 2002-04-09
6348296 Copolymer resin, preparation thereof, and photoresist using the same Min Ho Jung, Hyung Gi Kim 2002-02-19