Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Projection exposure apparatus for microlithography for the production of semiconductor components

Projection exposure apparatus for microlithography for the production of semiconductor components

US Patent 9513562 · Granted Dec 6, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Power transmission system2023
Impregnating resin, conductor arrangement, electrical coil and electrical machin2020
Tape adhesive for an insulating tape in an insulation system and an insulation s2020
Insulation system for electrical machines2019
Arrangement for actuating an element in a microlithographic projection exposure 2019
Test arrangement for testing damper devices for damping a flap that is pivotable2018
Coupling device, particularly for coupling damping apparatus on a test frame of 2018
Optical component2018
Slot sealing material, slot seal and method for producing a slot seal2018
Facet mirror for use in a projection exposure apparatus for microlithography2018
Facet mirror for use in a projection exposure apparatus for microlithography2018
Optical projection system2018