Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Facet mirror for use in a projection exposure apparatus for microlithography

Facet mirror for use in a projection exposure apparatus for microlithography

US Patent 9996012 · Granted Jun 12, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for connecting two components by means of at least one ball2025
Radiation source and device for feeding back emitted radiation to a laser source2022
Apparatus for supporting at least one component2022
Reflective optical element for EUV lithography and method for adapting a geometr2021
Pupil facet mirror, optical system and illumination optics for a projection lith2021
Illumination intensity correction device for specifying an illumination intensit2020
Method for illuminating an object field of a projection exposure system2019
Lithography apparatus and method for operating a lithography apparatus2019
Reflecting coating with optimized thickness2018
Illumination optical assembly for a projection exposure apparatus2018
Illumination intensity correction device for predefining an illumination intensi2018
Illumination optical unit for EUV projection lithography2018