Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Load lock chamber designs for high-throughput processing system

Load lock chamber designs for high-throughput processing system

US Patent 9022715 · Granted May 5, 2015

Estimated economic value: $12,368,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for controlling foreline pressure2025
Method and system for detecting anomalies in a semiconductor processing system2025
In-situ wafer rotation for carousel processing chambers2023
Parameter sensing and computer modeling for gas delivery health monitoring2023
Reduction of Br2 and Cl2 in semiconductor processes2023
Pedestal support design for precise chamber matching and process control2022
Device to increase deposition uniformity in spatial ALD processing chamber2021
Temporal atomic layer deposition process chamber2021
High temperature heater for processing chamber2021
Apparatus for gaseous byproduct abatement and foreline cleaning2021
Apparatus for collection and subsequent reaction of liquid and solid effluent in2020
Method and apparatus for gas abatement2020