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Home › Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

US Patent 7959310 · Granted Jun 14, 2011

Estimated economic value: $5,367,000 ⓘ

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