Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

US Patent 7933016 · Granted Apr 26, 2011

Estimated economic value: $13,337,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Robust and accurate overlay target design for CMP2025
Corneal topography measurement and alignment of corneal surgical procedures2025
Optical and X-ray metrology methods for patterned semiconductor structures with 2025
Single cell in-die metrology targets and measurement methods2025
Predicting tool induced shift using Moiré overlay targets2025
Tunable DUV laser assembly2025
Electron gun and electron microscope2025
Full beam metrology for x-ray scatterometry systems2025
Multi-layered moiré targets and methods for using the same in measuring misregis2025
Metrology target design for tilted device designs2024
Imaging overlay targets using moiré elements and rotational symmetry arrangement2024
Measurement of stitching error using split targets2024