Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and systems to compensate for a stitching disturbance of a printed pattern

Methods and systems to compensate for a stitching disturbance of a printed pattern

US Patent 7773199 · Granted Aug 10, 2010

Estimated economic value: $2,240,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for region of interest processing for reticle particle detection2025
Method for filtering an image and associated metrology apparatus2025
Systems and methods for measuring intensity in a lithographic alignment apparatu2025
Contaminant identification metrology system, lithographic apparatus, and methods2025
Monolithic particle inspection device2025
Self-referencing integrated alignment sensor2025
Spectrometric metrology systems based on multimode interference and lithographic2024
Overlay measurement system using lock-in amplifier technique2024
Lithographic apparatus, metrology systems, phased array illumination sources and2024
Invariable magnification multilevel optical device with telecentric converter2024
Pulsed charged-particle beam system2024
Apparatus for and method of sensing alignment marks2023