Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process

Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process

US Patent 6894773 · Granted May 17, 2005

Estimated economic value: $82,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Alignment device and alignment method2025
Quality control method, quality control system, management apparatus, analyzer, 2024
Support system for specified inspection, support method for specified inspection2023
Molded body for electronic function, method for manufacturing the same, and oper2022
Quality control method, quality control system, management apparatus, analyzer, 2022
Orientation device, production method for magnetic recording medium, and magneti2022
Input device2021
Defect inspection device and defect inspection method2017
Apparatus for inspecting defect with time/spatial division optical system2017
Surface inspection apparatus and method thereof2017
Inspection system2017
Semiconductor device and process for producing the same2016