Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Source drain implant during ONO formation for improved isolation of SONOS devices

Source drain implant during ONO formation for improved isolation of SONOS devices

US Patent 6436768 · Granted Aug 20, 2002

Estimated economic value: $3,107,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Compact light splitting devices and methods2025
Polarization beam splitter using asymmetric power splitting and multipath interf2025
Silicone-based barrier compositions2025
One-time programmable (ROTP) NVM2025
Dual distanced sensing method for passive range finding2025
Optical sightline tracking for a wearable system2025
Method and system for determining attenuated seismic time2024
Method, apparatus, and system for identifying surface locations corresponding to2024
Passive three-dimensional object authentication based on image sizing2023
Passive three-dimensional image sensing based on referential image blurring2023
Passive three-dimensional image sensing based on referential image blurring with2023
Optical sensing of fingerprints or other patterns on or near display screen usin2023