Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing using multiple radio frequency power feeds for improved uniformity

Plasma processing using multiple radio frequency power feeds for improved uniformity

US Patent 11276562 · Granted Mar 15, 2022

Estimated economic value: $44,583,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

External recirculation for gas lock relief2025
AFE (active far edge) heater/bipolar ESC with simplified and optimized structure2025
Showerhead design to control stray deposition2025
Showerhead design to control stray deposition2025
Showerhead design to control stray deposition2025
Vacuum interrupter with slow opening solenoid core inside to shorten the length 2025
Chamber configurations and processes for particle control2025
Chamber configurations and processes for particle control2025
Impedance control of local areas of a substrate during plasma deposition thereon2025
Systems and methods of seasoning electrostatic chucks with dielectric seasoning 2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Electrical gas lift valves and assemblies2025