{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method and apparatus for asymmetric selective physical vapor deposition", "item": "https://www.patentleaderboard.com/patent/10815561"}]}
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Home › Method and apparatus for asymmetric selective physical vapor deposition

Method and apparatus for asymmetric selective physical vapor deposition

US Patent 10815561 · Granted Oct 27, 2020

Estimated economic value: $26,711,000 ⓘ

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