KH

Keisuke Hashimoto

NI Nissan Chemical Industries: 49 patents #10 of 1,150Top 1%
KT Kabushiki Kaisha Toshiba: 17 patents #1,748 of 21,451Top 9%
MC Minolta Co.: 12 patents #154 of 1,416Top 15%
EH E Ink Holdings: 8 patents #128 of 639Top 25%
SE Seiko Epson: 7 patents #2,406 of 7,774Top 35%
SO Sony: 6 patents #6,793 of 25,231Top 30%
Dai Nippon Printing Co.: 5 patents #462 of 2,222Top 25%
TS Toshiba Medical Systems: 3 patents #374 of 1,088Top 35%
Kawasaki: 2 patents #1,008 of 2,943Top 35%
Canon: 2 patents #12,681 of 19,416Top 70%
SI Sumitomo Rubber Industries: 1 patents #1,096 of 1,637Top 70%
EC Eisai R&D Management Co.: 1 patents #478 of 817Top 60%
SC Sekisui Chemical Co.: 1 patents #529 of 908Top 60%
NU Nagoya University: 1 patents #34 of 109Top 35%
Overall (All Time): #11,435 of 4,157,543Top 1%
112
Patents All Time

Issued Patents All Time

Showing 26–50 of 112 patents

Patent #TitleCo-InventorsDate
11300879 Resist underlayer film forming composition containing triaryldiamine-containing novolac resin Daigo Saito, Rikimaru Sakamoto 2022-04-12
11199775 Resist underlayer film-forming composition containing naphthol aralkyl resin Ryo Karasawa 2021-12-14
11199777 Resist underlayer film-forming composition containing novolac polymer having secondary amino group Hirokazu Nishimaki, Rikimaru Sakamoto, Takafumi Endo 2021-12-14
11169441 Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device Daigo Saito, Rikimaru Sakamoto 2021-11-09
10894887 Composition for forming film protecting against aqueous hydrogen peroxide solution Hikaru TOKUNAGA, Yuto HASHIMOTO, Rikimaru Sakamoto 2021-01-19
10871712 Stepped substrate-coating composition containing polyether resin having photocrosslinkable group Hikaru TOKUNAGA, Takafumi Endo, Rikimaru Sakamoto 2020-12-22
10809670 Timing apparatus, timing method, and electronic appliance 2020-10-20
10809619 Resist underlayer film-forming composition containing substituted crosslinkable compound Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Takafumi Endo, Hirokazu Nishimaki 2020-10-20
10804111 Method for roughening surface using wet treatment Yasunobu Someya, Takahiro Kishioka, Rikimaru Sakamoto 2020-10-13
10755408 Medical information processing system and medical information processing apparatus Yasuo Sakurai, Masahiro Ozaki, Atsuko Sugiyama, Seiko Yoshimura 2020-08-25
10670892 Foldable electro-optic display apparatus Kenji Nakazawa 2020-06-02
10585353 Resist underlayer film forming composition Hirokazu Nishimaki, Rikimaru Sakamoto 2020-03-10
10551737 Method for forming resist underlayer film Ryo Karasawa, Tetsuya Shinjo 2020-02-04
10509320 Underlying coating forming composition for lithography containing compound having protected carboxyl group Satoshi Takei, Tetsuya Shinjo, Yasushi Sakaida 2019-12-17
10495941 Foldable electro-optic display including digitization and touch sensing Kenji Nakazawa 2019-12-03
10394124 Resist underlayer film-forming composition containing polymer having arylene group Rikimaru Sakamoto, Hirokazu Nishimaki, Takafumi Endo 2019-08-27
10315467 Pneumatic tire Eisuke HIROSUE 2019-06-11
10191374 Resist underlayer film-forming composition Hirokazu Nishimaki, Takafumi Endo, Rikimaru Sakamoto 2019-01-29
10146261 Wearable apparatus having a flexible electrophoretic display Kenji Nakazawa 2018-12-04
10017664 Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde Takafumi Endo, Hirokazu Nishimaki, Rikimaru Sakamoto 2018-07-10
10002556 Display control to alleviate transition of pixel to an undesired level of gradation over time Eisuke Matsuyama, Yoko Uto, Takeshi Furusho 2018-06-19
9746772 Resist underlayer film forming composition for lithography containing polyether structure-containing resin Hiroaki Okuyama, Yasunobu Someya, Masakazu Kato, Tetsuya Shinjo 2017-08-29
9610262 Therapeutic and/or preventive agent comprising 1-indansulfamide derivative for pain Hiroyuki Higashiyama, Yuji Kazuta 2017-04-04
9589709 Method for manufacturing string-like object covered with embroidery material Tomoaki Tanabe, Kae Asakuni 2017-03-07
9514949 Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure Yasunobu Someya, Yuki Usui, Masakazu Kato, Tetsuya Shinjo, Ryo Karasawa 2016-12-06