Issued Patents All Time
Showing 26–50 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7936441 | Projection optical system, exposure apparatus, and exposure method | — | 2011-05-03 |
| 7710653 | Projection optical system, exposure system, and exposure method | Hironori Ikezawa, Yuji Kudo | 2010-05-04 |
| 7701640 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa, David M. Williamson | 2010-04-20 |
| 7688422 | Projection optical system, exposure system, and exposure method | Hironori Ikezawa | 2010-03-30 |
| 7688517 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa | 2010-03-30 |
| 7619827 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa | 2009-11-17 |
| 7609455 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa | 2009-10-27 |
| 7580197 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa | 2009-08-25 |
| 7557997 | Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element | Hironori Ikezawa | 2009-07-07 |
| 7551362 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa | 2009-06-23 |
| 7471374 | Projection optical system, exposure apparatus, and exposure method | Hironori Ikezawa, Kumiko Ishida | 2008-12-30 |
| 7457042 | Projection optical system, exposure apparatus, and exposure method | — | 2008-11-25 |
| 7362508 | Projection optical system and method for photolithography and exposure apparatus and method using same | Hironori Ikezawa, David M. Williamson | 2008-04-22 |
| 7348575 | Projection optical system, exposure apparatus, and exposure method | — | 2008-03-25 |
| 7319508 | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices | Naomasa Shiraishi, Soichi Owa | 2008-01-15 |
| 7312463 | Projection optical system, exposure apparatus, and exposure method | — | 2007-12-25 |
| 7309870 | Projection optical system, exposure apparatus, and exposure method | — | 2007-12-18 |
| 7301605 | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices | Naomasa Shiraishi, Soichi Owa | 2007-11-27 |
| 7154585 | Projection optical system, exposure apparatus, and device production method | Koji Shigematsu, Youhei Fujishima, Toshiro Ishiyama | 2006-12-26 |
| 6909492 | Projection optical system, exposure apparatus and exposure method | — | 2005-06-21 |
| 6903803 | Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus | — | 2005-06-07 |
| 6864961 | Projection exposure methods and apparatus, and projection optical systems | — | 2005-03-08 |
| 6844982 | Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system | — | 2005-01-18 |
| 6844915 | Optical system and exposure apparatus provided with the optical system | Soichi Owa, Naomasa Shiraishi, Issey Tanaka | 2005-01-18 |
| 6831731 | Projection optical system and an exposure apparatus with the projection optical system | Naomasa Shiraishi, Issey Tanaka, Soichi Owa, Toshihiko Ozawa, Shunsuke Niisaka | 2004-12-14 |