Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6359678 | Exposure apparatus, method for producing the same, and exposure method | — | 2002-03-19 |
| 6341007 | Exposure apparatus and method | Kenji Nishi | 2002-01-22 |
| 6306548 | Micro devices manufacturing method and apparatus therefor | Shinji Mizutani, Masahiko Yasuda | 2001-10-23 |
| 6249336 | Projection exposure system | — | 2001-06-19 |
| 6236448 | Projection exposure system | — | 2001-05-22 |
| 6228544 | Exposure method utilizing pre-exposure reduction of substrate temperature | — | 2001-05-08 |
| 6153886 | Alignment apparatus in projection exposure apparatus | Shigeru Hagiwara, Hideo Mizutani | 2000-11-28 |
| 6110021 | Micro devices manufacturing method and apparatus therefor | Masahiko Yasuda | 2000-08-29 |
| 6097473 | Exposure apparatus and positioning method | Shigeru Nakayama | 2000-08-01 |
| 6094255 | Projection exposure apparatus and method that floats a plate | — | 2000-07-25 |
| 6061119 | Method of measuring image-forming error of projection optical system, method of manufacturing exposure apparatus, and method of manufacturing semiconductor device | — | 2000-05-09 |
| 6057908 | Exposure condition measurement method | — | 2000-05-02 |
| 6018384 | Projection exposure system | — | 2000-01-25 |
| 5981116 | Alignment in a projection exposure method | — | 1999-11-09 |
| 5978071 | Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage | Hideyuki Miyajima, Susumu Makinouchi | 1999-11-02 |
| 5942357 | Method of measuring baseline amount in a projection exposure apparatus | — | 1999-08-24 |
| 5914774 | Projection exposure apparatus with function to measure imaging characteristics of projection optical system | — | 1999-06-22 |
| 5831739 | Alignment method | — | 1998-11-03 |
| 5801389 | Acousto-optic modulator, position detector using it, and projection exposure apparatus | Hidoe Mizutani | 1998-09-01 |
| 5721607 | Alignment method and apparatus | — | 1998-02-24 |
| 5715063 | Projection exposure method | — | 1998-02-03 |
| 5689339 | Alignment apparatus | Kouichirou Komatsu, Hideo Mizutani, Nobutaka Magome | 1997-11-18 |
| 5601957 | Micro devices manufacturing method comprising the use of a second pattern overlying an alignment mark to reduce flattening | Shinji Mizutani, Masahiko Yasuda | 1997-02-11 |
| 5602644 | Alignment apparatus utilizing a plurality of wavelengths | — | 1997-02-11 |
| 5569929 | Double-beam light source apparatus, position detecting apparatus and aligning apparatus | Hideo Mizutani | 1996-10-29 |