Issued Patents All Time
Showing 1–25 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8592284 | Semiconductor device and manufacturing method thereof | Masato Ishibashi, Katsuyuki Horita, Tomohiro Yamashita, Takaaki Tsunomura | 2013-11-26 |
| 8043918 | Semiconductor device and its manufacturing method | Katsuyuki Horita, Masashi Kitazawa, Masato Ishibashi | 2011-10-25 |
| 7791163 | Semiconductor device and its manufacturing method | Katsuyuki Horita, Masashi Kitazawa, Masato Ishibashi | 2010-09-07 |
| 6890837 | Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate | Katsuyuki Horita, Katsuomi Shiozawa | 2005-05-10 |
| 6841440 | Semiconductor device including impurity layer having continuous portions formed at different depths and method of manufacturing the same | Syuichi Ueno, Katsuyuki Horita | 2005-01-11 |
| 6744113 | Semiconductor device with element isolation using impurity-doped insulator and oxynitride film | Tomohiro Yamashita, Katsuyuki Horita | 2004-06-01 |
| 6737315 | Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate | Katsuyuki Horita, Katsuomi Shiozawa | 2004-05-18 |
| 6707099 | Semiconductor device and manufacturing method thereof | Katsuomi Shiozawa, Katsuyuki Horita | 2004-03-16 |
| 6667221 | Method of manufacturing semiconductor device | Masashi Kitazawa, Tomohiro Yamashita | 2003-12-23 |
| 6661066 | Semiconductor device including inversely tapered gate electrode and manufacturing method thereof | Yasuyoshi Itoh, Katsuyuki Horita, Katsuomi Shiozawa | 2003-12-09 |
| 6577021 | Static-type semiconductor memory device | Chikayoshi Morishima, Yoshinori Okumura | 2003-06-10 |
| 6548871 | Semiconductor device achieving reduced wiring length and reduced wiring delay by forming first layer wiring and gate upper electrode in same wire layer | Katsuyuki Horita, Yasuyoshi Itoh, Katsuomi Shiozawa | 2003-04-15 |
| 6541825 | Semiconductor device including impurity layer having continuous portions formed at different depths and method of manufacturing the same | Syuichi Ueno, Katsuyuki Horita | 2003-04-01 |
| 6521527 | Semiconductor device and method of fabricating the same | Shuichi Ueno, Hidekazu Oda, Satoshi Shimizu | 2003-02-18 |
| 6503799 | Method of manufacturing semiconductor device | Katsuyuki Horita, Shuuichi Ueno | 2003-01-07 |
| 6498077 | Semiconductor device and method of manufacturing same | Shuuichi Ueno, Katsuyuki Horita | 2002-12-24 |
| 6482718 | Method of manufacturing semiconductor device | Katsuomi Shiozawa, Katsuyuki Horita | 2002-11-19 |
| 6399985 | Semiconductor device | Katsuyuki Horita, Yoshinori Okumura | 2002-06-04 |
| 6383884 | Method of manufacturing semiconductor device | Katsuomi Shiozawa, Yasuyoshi Itoh, Katsuyuki Horita | 2002-05-07 |
| 6372604 | Method for forming a trench type element isolation structure and trench type element isolation structure | Maiko Sakai, Katsuyuki Horita | 2002-04-16 |
| 6323102 | Method of manufacturing a semiconductor device | Katsuyuki Horita, Maiko Sakai | 2001-11-27 |
| 6303432 | Method of manufacturing a semiconductor device | Katsuyuki Horita, Yasuyoshi Itoh, Katsuomi Siozawa | 2001-10-16 |
| 6300664 | Semiconductor device and method of fabricating the same | Shuichi Ueno, Hidekazu Oda, Satoshi Shimizu | 2001-10-09 |
| 6274457 | Method for manufacturing an isolation trench having plural profile angles | Maiko Sakai, Katsuyuki Horita | 2001-08-14 |
| 6268263 | Method of forming a trench type element isolation in semiconductor substrate | Maiko Sakai, Katsuyuki Horita | 2001-07-31 |