Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10545172 | Cantilever and manufacturing method for cantilever | Masaki Tanemura, Riteshkumar Ratneshkumar Vishwakarma, Mohamad Saufi Bin Rosmi, Yazid Bin Yaakob, Yuji Wakamatsu | 2020-01-28 |
| 10203354 | Cantilever for a scanning type probe microscope | Michitsugu Arima, Masaki Tanemura | 2019-02-12 |
| 8754471 | Semiconductor device having gate in recess | Toshiaki Iwamatsu, Kozo Ishikawa, Kiyoshi Hayashi, Takahiro Maruyama, Masaaki Shinohara +1 more | 2014-06-17 |
| 8043918 | Semiconductor device and its manufacturing method | Takashi Kuroi, Katsuyuki Horita, Masato Ishibashi | 2011-10-25 |
| 7791163 | Semiconductor device and its manufacturing method | Takashi Kuroi, Katsuyuki Horita, Masato Ishibashi | 2010-09-07 |
| 7735357 | SPM cantilever and manufacturing method thereof | Ryo Ota, Masaki Tanemura | 2010-06-15 |
| 7543482 | Carbon thin line probe | Masaki Tanemura, Junya Tanaka, Tatsuhiko OKITA | 2009-06-09 |
| 7010966 | SPM cantilever and fabricating method thereof | Koichi Shiotani, Akitoshi Toda | 2006-03-14 |
| 6918286 | SPM cantilever | Koichi Shiotani | 2005-07-19 |
| 6694805 | Cantilever for scanning probe microscopy | Koichi Shiotani, Kenji Sato, Akitoshi Toda | 2004-02-24 |
| 6667221 | Method of manufacturing semiconductor device | Tomohiro Yamashita, Takashi Kuroi | 2003-12-23 |
| 6664602 | Semiconductor device and method of manufacturing the same | Tomohiro Yamashita | 2003-12-16 |
| 6525380 | CMOS with a fixed charge in the gate dielectric | Masayoshi Shirahata, Kazunobu Oota | 2003-02-25 |
| 6521517 | Method of fabricating a gate electrode using a second conductive layer as a mask in the formation of an insulating layer by oxidation of a first conductive layer | Kazunobu Ota, Masayoshi Shirahata | 2003-02-18 |
| 6521963 | Semiconductor device and method of manufacturing semiconductor device | Kazunobu Ota, Masayoshi Shirahata | 2003-02-18 |
| 6518623 | Semiconductor device having a buried-channel MOS structure | Hidekazu Oda, Katsuomi Shiozawa | 2003-02-11 |
| 6461934 | Method of manufacturing semiconductor device having trench type element isolation regions | Yukio Nishida, Shuichi Ueno | 2002-10-08 |
| 6335556 | Semiconductor device and method for manufacturing semiconductor device | Masayoshi Shirahata, Tomohiro Yamashita | 2002-01-01 |
| 6333222 | Semiconductor device and manufacturing method thereof | Masayoshi Shirahata, Kazunobu Ohta | 2001-12-25 |
| 6248653 | Method of manufacturing gate structure | Masayoshi Shirahata, Kazunobu Ota | 2001-06-19 |
| 5742468 | Electric charge generator for use in an apparatus for producing an electrostatic latent image | Kazuya Matsumoto, Yukiaki Minamoto, Jun Funazaki, Michitsugu Arima, Fumitaka Ozeki +1 more | 1998-04-21 |