MS

Masayoshi Shirahata

Mitsubishi Electric: 14 patents #1,823 of 25,717Top 8%
TT The Ritsumeikan Trust: 5 patents #6 of 141Top 5%
BJ Brillnics Japan: 4 patents #2 of 16Top 15%
RT Renesas Technology: 3 patents #990 of 3,337Top 30%
BR Brillnics: 1 patents #10 of 17Top 60%
Overall (All Time): #193,144 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
11637982 Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus Shunsuke Okura, Takeshi Fujino, Mitsuru Shiozaki, Takaya Kubota 2023-04-25
11336857 Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus Shunsuke Okura, Kenichiro Ishikawa, Takeshi Fujino, Mitsuru Shiozaki, Takaya Kubota 2022-05-17
10484638 Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus for preventing tampering of an image Shunsuke Okura, Masato Yamaguchi, Takeshi Fujino, Mitsuru Shiozaki, Takaya Kubota 2019-11-19
10382708 Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus with physically unclonable function Isao Takayanagi, Shunsuke Tanaka, Shinichiro Matsuo, Shunsuke Okura, Shusuke Iwata +4 more 2019-08-13
10356353 Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus Shunsuke Okura, Masato Yamaguchi, Takeshi Fujino, Mitsuru Shiozaki, Takaya Kubota 2019-07-16
6872628 Method of manufacturing semiconductor device Yukio Nishida 2005-03-29
6737336 Semiconductor device and manufacturing method therefor Shuuichi Ueno, Yasuo Inoue 2004-05-18
6686059 Semiconductor device manufacturing method and semiconductor device 2004-02-03
6555887 Semiconductor device with multi-layer interconnection Takeshi Kitani, Takeru Matsuoka 2003-04-29
6525380 CMOS with a fixed charge in the gate dielectric Masashi Kitazawa, Kazunobu Oota 2003-02-25
6521517 Method of fabricating a gate electrode using a second conductive layer as a mask in the formation of an insulating layer by oxidation of a first conductive layer Kazunobu Ota, Masashi Kitazawa 2003-02-18
6521963 Semiconductor device and method of manufacturing semiconductor device Kazunobu Ota, Masashi Kitazawa 2003-02-18
6461920 Semiconductor device and method of manufacturing the same Yoshinori Okumura 2002-10-08
6417555 Semiconductor device and manufacturing method therefor Shuuichi Ueno, Yasuo Inoue 2002-07-09
6335556 Semiconductor device and method for manufacturing semiconductor device Masashi Kitazawa, Tomohiro Yamashita 2002-01-01
6333222 Semiconductor device and manufacturing method thereof Masashi Kitazawa, Kazunobu Ohta 2001-12-25
6248653 Method of manufacturing gate structure Masashi Kitazawa, Kazunobu Ota 2001-06-19
6163046 Semiconductor device and method of fabricating semiconductor device Yoshinori Okumura 2000-12-19
6144079 Semiconductor device and method of manufacturing the same Yoshinori Okumura 2000-11-07
5683923 Semiconductor memory device capable of electrically erasing and writing information and a manufacturing method of the same Masahiro Shimizu, Takashi Kuroi, Takehisa Yamaguchi 1997-11-04
5594264 LDD semiconductor device with peak impurity concentrations Yoshinori Okumura 1997-01-14
5488245 Semiconductor memory device capable of electrically erasing and writing information Masahiro Shimizu, Takashi Kuroi, Takehisa Yamaguchi 1996-01-30