Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8163576 | Nitride semiconductor device having a silicon-containing layer and manufacturing method thereof | Kyozo Kanamoto, Kazushige Kawasaki, Hitoshi Sakuma, Yuji Abe | 2012-04-24 |
| 7964424 | Method for manufacturing nitride semiconductor light-emitting element | Kyozo Kanamoto, Kazushige Kawasaki, Shinji Abe, Hitoshi Sakuma | 2011-06-21 |
| 7939943 | Nitride semiconductor device including an electrode in ohmic contact with a P-type nitride semiconductor contact layer | Kyozo Kanamoto, Toshiyuki Oishi, Hiroshi Kurokawa, Kenichi Ohtsuka, Yoichiro Tarui +1 more | 2011-05-10 |
| 7842962 | Nitride semiconductor device and method of manufacturing the same | Toshiyuki Oishi, Kazushige Kawasaki, Yuji Abe | 2010-11-30 |
| 7795738 | Nitride semiconductor device | Kyozo Kanamoto, Hiroshi Kurokawa, Yasunori Tokuda, Kyosuke Kuramoto, Hitoshi Sakuma | 2010-09-14 |
| 7791097 | Nitride semiconductor device and manufacturing method of the same | Kyozo Kanamoto, Kazushige Kawasaki, Hitoshi Sakuma, Junichi Horie, Toshihiko Shiga +1 more | 2010-09-07 |
| 7714439 | Nitride semiconductor device and method of manufacturing the same | Hitoshi Sakuma, Kazushige Kawasaki, Toshihiko Shiga, Toshiyuki Oishi | 2010-05-11 |
| 7683398 | Nitride semiconductor device having a silicon-containing connection layer and manufacturing method thereof | Kyozo Kanamoto, Kazushige Kawasaki, Hitoshi Sakuma, Yuji Abe | 2010-03-23 |
| 7678597 | Method of manufacturing semiconductor device including gallium-nitride semiconductor structure and a palladium contact | Kenichi Ohtsuka, Yoichiro Tarui, Yosuke Suzuki, Kyozo Kanamoto, Toshiyuki Oishi +2 more | 2010-03-16 |
| 7582908 | Nitride semiconductor device and manufacturing method thereof | Kyozo Kanamoto, Kazushige Kawasaki, Hitoshi Sakuma, Yoshiyuki Suehiro | 2009-09-01 |
| 7456039 | Method for manufacturing semiconductor optical device | Kazushige Kawasaki, Takafumi Oka | 2008-11-25 |
| 7378351 | Method of manufacturing nitride semiconductor device | Toshiyuki Oishi, Kazushige Kawasaki, Zempei Kawazu, Yuji Abe | 2008-05-27 |
| 7067874 | Semiconductor device including trench with at least one of an edge of an opening and a bottom surface being round | Katsumi Nakamura, Tadaharu Minato, Shuuichi Tominaga | 2006-06-27 |
| 6890837 | Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate | Takashi Kuroi, Katsuyuki Horita | 2005-05-10 |
| 6737315 | Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate | Takashi Kuroi, Katsuyuki Horita | 2004-05-18 |
| 6710401 | Semiconductor device including a trench with at least one of an edge of an opening and a bottom surface being round | Katsumi Nakamura, Tadaharu Minato, Shuuichi Tominaga | 2004-03-23 |
| 6707099 | Semiconductor device and manufacturing method thereof | Takashi Kuroi, Katsuyuki Horita | 2004-03-16 |
| 6661066 | Semiconductor device including inversely tapered gate electrode and manufacturing method thereof | Takashi Kuroi, Yasuyoshi Itoh, Katsuyuki Horita | 2003-12-09 |
| 6548871 | Semiconductor device achieving reduced wiring length and reduced wiring delay by forming first layer wiring and gate upper electrode in same wire layer | Katsuyuki Horita, Takashi Kuroi, Yasuyoshi Itoh | 2003-04-15 |
| 6518623 | Semiconductor device having a buried-channel MOS structure | Hidekazu Oda, Masashi Kitazawa | 2003-02-11 |
| 6518635 | Semiconductor device and manufacturing method thereof | Toshiyuki Oishi, Yuji Abe, Yasunori Tokuda | 2003-02-11 |
| 6482718 | Method of manufacturing semiconductor device | Takashi Kuroi, Katsuyuki Horita | 2002-11-19 |
| 6387743 | Semiconductor device manufacturing method and semiconductor device | Syuichi Ueno, Yasuyoshi Itoh | 2002-05-14 |
| 6383884 | Method of manufacturing semiconductor device | Takashi Kuroi, Yasuyoshi Itoh, Katsuyuki Horita | 2002-05-07 |
| 6333540 | Semiconductor device manufacturing method and semiconductor device | Syuichi Ueno, Yasuyoshi Itoh | 2001-12-25 |